Tailoring the hybrid magnetron sputtering process (HiPIMS and dcMS) to manufacture ceramic multilayers: powering conditions, target materials, and base layers (2022)
- Authors:
- USP affiliated authors: PINTO, HAROLDO CAVALCANTI - EESC ; AVILA, PEDRO RENATO TAVARES - EESC ; APOLINARIO, RAIRA CHEFER - EESC
- Unidade: EESC
- DOI: 10.3390/nano12142465
- Subjects: CERÂMICA; RESISTÊNCIA DOS MATERIAIS; MATERIAIS
- Agências de fomento:
- Language: Inglês
- Imprenta:
- Publisher: MDPI
- Publisher place: Basel, Switzerland
- Date published: 2022
- Source:
- Título: Nanomaterials
- ISSN: 2079-4991
- Volume/Número/Paginação/Ano: v. 12, article 2465, p. 1-12, 2022
- Este periódico é de acesso aberto
- Este artigo é de acesso aberto
- URL de acesso aberto
- Cor do Acesso Aberto: gold
- Licença: cc-by
-
ABNT
CASTILHO, Bruno Cesar Noronha Marques de et al. Tailoring the hybrid magnetron sputtering process (HiPIMS and dcMS) to manufacture ceramic multilayers: powering conditions, target materials, and base layers. Nanomaterials, v. 12, p. 1-12, 2022Tradução . . Disponível em: https://doi.org/10.3390/nano12142465. Acesso em: 30 dez. 2025. -
APA
Castilho, B. C. N. M. de, Mazuco, F. de S., Rodrigues, A. M., Avila, P. R. T., Apolinário, R. C., Daum, P., et al. (2022). Tailoring the hybrid magnetron sputtering process (HiPIMS and dcMS) to manufacture ceramic multilayers: powering conditions, target materials, and base layers. Nanomaterials, 12, 1-12. doi:10.3390/nano12142465 -
NLM
Castilho BCNM de, Mazuco F de S, Rodrigues AM, Avila PRT, Apolinário RC, Daum P, Costa FP da, Menezes RR, Neves G de A, Greiner C, Pinto HC. Tailoring the hybrid magnetron sputtering process (HiPIMS and dcMS) to manufacture ceramic multilayers: powering conditions, target materials, and base layers [Internet]. Nanomaterials. 2022 ; 12 1-12.[citado 2025 dez. 30 ] Available from: https://doi.org/10.3390/nano12142465 -
Vancouver
Castilho BCNM de, Mazuco F de S, Rodrigues AM, Avila PRT, Apolinário RC, Daum P, Costa FP da, Menezes RR, Neves G de A, Greiner C, Pinto HC. Tailoring the hybrid magnetron sputtering process (HiPIMS and dcMS) to manufacture ceramic multilayers: powering conditions, target materials, and base layers [Internet]. Nanomaterials. 2022 ; 12 1-12.[citado 2025 dez. 30 ] Available from: https://doi.org/10.3390/nano12142465 - On improving wear resistance of Cr-Al-N coatings using dynamic glancing angle DC magnetron sputtering
- Role of nitrogen and yttrium contents in manufacturing (Cr, Y)Nx film nanostructures
- Hybrid magnetron sputtering of ceramic superlattices for application in a next generation of combustion engines
- Effect of rapid solidification processing on the microstructure and corrosion of 316L austenitic stainless steel
- Manufacture and optimization of nanostructured Cr-Al-N coatings produced by reactive magnetron sputtering
- Corrosion and tribological behavior of Cr–Y–N multilayers grown by HIPIMS as a function of progressive changes in the coating architecture
- Caracterização de aços austeníticos ao manganês de elevada resistência mecânica
- Avaliação da microestrutura de ligas de magnésio de alto desempenho ZK60 soldadas por fricção e mistura mecânica (SFMM)
- Microstructure and residual stress formation during friction-stir welding of semi-solid cast ZK-60-RE magnesium alloy
- Casting in the semi-solid state of ZK60 magnesium alloy modified with rare earth addition
Informações sobre o DOI: 10.3390/nano12142465 (Fonte: oaDOI API)
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