Investigation on dual functional epoxy resins containing photosensitive group in the main chain for photoresist applications (2020)
- Authors:
- Autor USP: PETRI, DENISE FREITAS SIQUEIRA - IQ
- Unidade: IQ
- DOI: 10.1080/1023666X.2020.1780849
- Subjects: RESINAS EPOXI; ESPECTROSCOPIA
- Language: Inglês
- Imprenta:
- Source:
- Título: International Journal of Polymer Analysis and Characterization
- ISSN: 1023-666X
- Volume/Número/Paginação/Ano: v. 25, N. 4 p. 198–215, 2020
- Este periódico é de acesso aberto
- Este artigo NÃO é de acesso aberto
-
ABNT
KRISHNASAMY, Balaji et al. Investigation on dual functional epoxy resins containing photosensitive group in the main chain for photoresist applications. International Journal of Polymer Analysis and Characterization, v. 25, p. N. 4 198–215, 2020Tradução . . Disponível em: https://doi.org/10.1080/1023666X.2020.1780849. Acesso em: 23 jan. 2026. -
APA
Krishnasamy, B., Shanmugaraj, B. P., Murugavel, S. C., Dai, L., & Petri, D. F. S. (2020). Investigation on dual functional epoxy resins containing photosensitive group in the main chain for photoresist applications. International Journal of Polymer Analysis and Characterization, 25, N. 4 198–215. doi:10.1080/1023666X.2020.1780849 -
NLM
Krishnasamy B, Shanmugaraj BP, Murugavel SC, Dai L, Petri DFS. Investigation on dual functional epoxy resins containing photosensitive group in the main chain for photoresist applications [Internet]. International Journal of Polymer Analysis and Characterization. 2020 ; 25 N. 4 198–215.[citado 2026 jan. 23 ] Available from: https://doi.org/10.1080/1023666X.2020.1780849 -
Vancouver
Krishnasamy B, Shanmugaraj BP, Murugavel SC, Dai L, Petri DFS. Investigation on dual functional epoxy resins containing photosensitive group in the main chain for photoresist applications [Internet]. International Journal of Polymer Analysis and Characterization. 2020 ; 25 N. 4 198–215.[citado 2026 jan. 23 ] Available from: https://doi.org/10.1080/1023666X.2020.1780849 - Vaginal administration of contraceptives
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Informações sobre o DOI: 10.1080/1023666X.2020.1780849 (Fonte: oaDOI API)
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