Films deposited from reactive sputtering of aluminum acetylacetonate under low energy ion bombardment (2017)
- Authors:
- USP affiliated authors: SILVA, TIAGO FIORINI DA - IF ; TABACNIKS, MANFREDO HARRI - IF
- Unidade: IF
- DOI: 10.1590/1980-5373-MR-2016-0647
- Subjects: ÍONS; ESPECTROSCOPIA
- Language: Inglês
- Imprenta:
- Publisher place: São Carlos
- Date published: 2017
- Source:
- Título do periódico: MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS
- Volume/Número/Paginação/Ano: v. 20, n. 4, p. 926-936, jul-ago. 2017
- Este periódico é de acesso aberto
- Este artigo é de acesso aberto
- URL de acesso aberto
- Cor do Acesso Aberto: gold
- Licença: cc-by
-
ABNT
BATTAGLIN, Felipe Augusto Darriba; PRADO, Eduardo Silva; CASELI, Luciano; et al. Films deposited from reactive sputtering of aluminum acetylacetonate under low energy ion bombardment. MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS, São Carlos, v. 20, n. 4, p. 926-936, 2017. Disponível em: < http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392017000400926&lng=en&tlng=em > DOI: 10.1590/1980-5373-MR-2016-0647. -
APA
Battaglin, F. A. D., Prado, E. S., Caseli, L., Rangel, E. C., Cruz, N. C. da, Silva, T. F. da, & Tabacniks, M. H. (2017). Films deposited from reactive sputtering of aluminum acetylacetonate under low energy ion bombardment. MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS, 20( 4), 926-936. doi:10.1590/1980-5373-MR-2016-0647 -
NLM
Battaglin FAD, Prado ES, Caseli L, Rangel EC, Cruz NC da, Silva TF da, Tabacniks MH. Films deposited from reactive sputtering of aluminum acetylacetonate under low energy ion bombardment [Internet]. MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS. 2017 ; 20( 4): 926-936.Available from: http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392017000400926&lng=en&tlng=em -
Vancouver
Battaglin FAD, Prado ES, Caseli L, Rangel EC, Cruz NC da, Silva TF da, Tabacniks MH. Films deposited from reactive sputtering of aluminum acetylacetonate under low energy ion bombardment [Internet]. MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS. 2017 ; 20( 4): 926-936.Available from: http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392017000400926&lng=en&tlng=em - Innovative low temperature plasma approach for deposition of alumina films
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Informações sobre o DOI: 10.1590/1980-5373-MR-2016-0647 (Fonte: oaDOI API)
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