Fabrication of mesoscopic block copolymer regular structures by dewetting and phase separation (2005)
- Authors:
- USP affiliated authors: SILVA, MARCELO DE ASSUMPCAO PEREIRA DA - IFSC ; FARIA, ROBERTO MENDONÇA - IFSC
- Unidade: IFSC
- DOI: 10.1109/ISE.2005.1612329
- Subjects: POLÍMEROS (MATERIAIS); MATERIAIS NANOESTRUTURADOS
- Language: Inglês
- Imprenta:
- Publisher: Institute of Electrical and Electronics Engineers - IEEE
- Publisher place: Piscataway
- Date published: 2005
- Source:
- Título: Proceedings
- Conference titles: International Symposium on Electrets - ISE
- Este periódico é de acesso aberto
- Este artigo NÃO é de acesso aberto
-
ABNT
CARVALHO, Antonio Jose Felix e SILVA, Marcelo de Assumpção Pereira da e FARIA, Roberto Mendonça. Fabrication of mesoscopic block copolymer regular structures by dewetting and phase separation. 2005, Anais.. Piscataway: Institute of Electrical and Electronics Engineers - IEEE, 2005. Disponível em: https://doi.org/10.1109/ISE.2005.1612329. Acesso em: 11 fev. 2026. -
APA
Carvalho, A. J. F., Silva, M. de A. P. da, & Faria, R. M. (2005). Fabrication of mesoscopic block copolymer regular structures by dewetting and phase separation. In Proceedings. Piscataway: Institute of Electrical and Electronics Engineers - IEEE. doi:10.1109/ISE.2005.1612329 -
NLM
Carvalho AJF, Silva M de AP da, Faria RM. Fabrication of mesoscopic block copolymer regular structures by dewetting and phase separation [Internet]. Proceedings. 2005 ;[citado 2026 fev. 11 ] Available from: https://doi.org/10.1109/ISE.2005.1612329 -
Vancouver
Carvalho AJF, Silva M de AP da, Faria RM. Fabrication of mesoscopic block copolymer regular structures by dewetting and phase separation [Internet]. Proceedings. 2005 ;[citado 2026 fev. 11 ] Available from: https://doi.org/10.1109/ISE.2005.1612329 - Dewetting of polymer thin films applied to polymeric ligh emitting devices
- Modeling of SEBS structures during pattern dynamic formation
- Ammonium free self-assembly deposition of CdS luminescent quantum dots on flexible-transparent substrate
- Soft-lithography usando copolímero tribloco
- Estruturas de copolímeros sub-micrometricas utilizadas em processo de litografia
- Morphological characterization of PPV multilayer by AFM technique
- Self-organized SEBS-copolymer nanostructures as patterning template
- Fabrication of submicrometric patterns from self-organized structures of block copolymers and transcription on solid surfaces
- Estudo de filmes finos polimericos usando caracterização paramétrica de imagens obtidas pela técnica de Microscopia de Força Atômica
- Self-organized periodic sub-micrometric structures from diluted block copolymer solutions
Informações sobre o DOI: 10.1109/ISE.2005.1612329 (Fonte: oaDOI API)
How to cite
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
