Study of sputtering processes, on metallic thin films, due to low energy ion implantation (2013)
- Authors:
- USP affiliated authors: SILVA, TIAGO FIORINI DA - IF ; RODRIGUES, CLEBER LIMA - IF ; RIZZUTTO, MARCIA DE ALMEIDA - IF ; ADDED, NEMITALA - IF ; TABACNIKS, MANFREDO HARRI - IF
- Unidade: IF
- Assunto: FÍSICA NUCLEAR
- Language: Inglês
- Imprenta:
- Source:
- Título do periódico: Resumos
- Conference titles: Reunião de Trabalho sobre Física Nuclear no Brasil
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ABNT
ROSA, Edson P. et al. Study of sputtering processes, on metallic thin films, due to low energy ion implantation. 2013, Anais.. Maresias: SBF, 2013. Disponível em: http://www.sbf1.sbfisica.org.br/eventos/rtfnb/xxxvi/sys/resumos/R0151-1.pdf. Acesso em: 29 mar. 2024. -
APA
Rosa, E. P., Delgado, A. O., Moro, M. V., Trindade, G. F., Silva, T. F. da, Rodrigues, C. L., et al. (2013). Study of sputtering processes, on metallic thin films, due to low energy ion implantation. In Resumos. Maresias: SBF. Recuperado de http://www.sbf1.sbfisica.org.br/eventos/rtfnb/xxxvi/sys/resumos/R0151-1.pdf -
NLM
Rosa EP, Delgado AO, Moro MV, Trindade GF, Silva TF da, Rodrigues CL, Rizzutto M de A, Added N, Tabacniks MH. Study of sputtering processes, on metallic thin films, due to low energy ion implantation [Internet]. Resumos. 2013 ;[citado 2024 mar. 29 ] Available from: http://www.sbf1.sbfisica.org.br/eventos/rtfnb/xxxvi/sys/resumos/R0151-1.pdf -
Vancouver
Rosa EP, Delgado AO, Moro MV, Trindade GF, Silva TF da, Rodrigues CL, Rizzutto M de A, Added N, Tabacniks MH. Study of sputtering processes, on metallic thin films, due to low energy ion implantation [Internet]. Resumos. 2013 ;[citado 2024 mar. 29 ] Available from: http://www.sbf1.sbfisica.org.br/eventos/rtfnb/xxxvi/sys/resumos/R0151-1.pdf - Elemental thin film depth profiles by using self-consistent ion beam analysis – MultiSIMNRA: a new computational tool
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