Doping of graphene adsorbed on the a-'SI''O IND.2' surface (2011)
- Authors:
- Autor USP: FAZZIO, ADALBERTO - IF
- Unidade: IF
- DOI: 10.1063/1.3653261
- Assunto: SEMICONDUTORES
- Language: Inglês
- Imprenta:
- Source:
- Título: APPLIED PHYSICS LETTERS
- Volume/Número/Paginação/Ano: v.99, n.16, p. 163108, out.2011
- Este periódico é de acesso aberto
- Este artigo NÃO é de acesso aberto
-
ABNT
MIWA, R H et al. Doping of graphene adsorbed on the a-'SI''O IND.2' surface. APPLIED PHYSICS LETTERS, v. 99, n. 16, p. 163108, 2011Tradução . . Disponível em: https://doi.org/10.1063/1.3653261. Acesso em: 02 fev. 2026. -
APA
Miwa, R. H., Schmidt, T. M., Scopel, W. L., & Fazzio, A. (2011). Doping of graphene adsorbed on the a-'SI''O IND.2' surface. APPLIED PHYSICS LETTERS, 99( 16), 163108. doi:10.1063/1.3653261 -
NLM
Miwa RH, Schmidt TM, Scopel WL, Fazzio A. Doping of graphene adsorbed on the a-'SI''O IND.2' surface [Internet]. APPLIED PHYSICS LETTERS. 2011 ;99( 16): 163108.[citado 2026 fev. 02 ] Available from: https://doi.org/10.1063/1.3653261 -
Vancouver
Miwa RH, Schmidt TM, Scopel WL, Fazzio A. Doping of graphene adsorbed on the a-'SI''O IND.2' surface [Internet]. APPLIED PHYSICS LETTERS. 2011 ;99( 16): 163108.[citado 2026 fev. 02 ] Available from: https://doi.org/10.1063/1.3653261 - Conformational analysis of tannic acid: environment effects in electronic and reactivity properties
- Ab initio study of n impurity in amorphous germanium
- Metastability in periodically 'DELTA'-doped 'GA''AS'
- Role played by n and n-n impurities in type-'IV' semiconductors
- Studies of the local reactivity of surfaces using chemical based principles
- Many-electron effects on the structural properties of sp impurities in semiconductors
- Dynamic spin susceptibility in the two-band model in high 'TE' superconductors
- Investigation of the many-particle spectrum of superconductor 'YBA IND.2' 'CU IND.3' 'O IND.7'
- Metallic states in Topological Insulators with Magnetic Impurities
- Non extensive thermodynamics and neutron star properties.
Informações sobre o DOI: 10.1063/1.3653261 (Fonte: oaDOI API)
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