Surface energy characterization of light-emitting diodes by Atomic Force Microscopy (AFM): contact angle and surface energy determination (2004)
- Authors:
- USP affiliated authors: FARIA, ROBERTO MENDONCA - IFSC ; SILVA, MARCELO DE ASSUMPCAO PEREIRA DA - IFSC
- Unidade: IFSC
- Subjects: POLÍMEROS (MATERIAIS); FILMES FINOS
- Language: Inglês
- Imprenta:
- Publisher: SBPMat
- Publisher place: São Carlos
- Date published: 2004
- Source:
- Título do periódico: Programa e Livro de Resumos
- Conference titles: Encontro da Sociedade Brasileira de Pesquisa em Materiais - SBPMat
-
ABNT
CARVALHO, A. J. F. e SILVA, Marcelo de Assumpção Pereira da e FARIA, Roberto Mendonça. Surface energy characterization of light-emitting diodes by Atomic Force Microscopy (AFM): contact angle and surface energy determination. 2004, Anais.. São Carlos: SBPMat, 2004. . Acesso em: 19 set. 2024. -
APA
Carvalho, A. J. F., Silva, M. de A. P. da, & Faria, R. M. (2004). Surface energy characterization of light-emitting diodes by Atomic Force Microscopy (AFM): contact angle and surface energy determination. In Programa e Livro de Resumos. São Carlos: SBPMat. -
NLM
Carvalho AJF, Silva M de AP da, Faria RM. Surface energy characterization of light-emitting diodes by Atomic Force Microscopy (AFM): contact angle and surface energy determination. Programa e Livro de Resumos. 2004 ;[citado 2024 set. 19 ] -
Vancouver
Carvalho AJF, Silva M de AP da, Faria RM. Surface energy characterization of light-emitting diodes by Atomic Force Microscopy (AFM): contact angle and surface energy determination. Programa e Livro de Resumos. 2004 ;[citado 2024 set. 19 ] - Soft lithography in ordered-desordered nanostructures of triblock copolymer
- Dewetting of polymer thin films applied to polymeric ligh emitting devices
- Modeling of SEBS structures during pattern dynamic formation
- Ammonium free self-assembly deposition of CdS luminescent quantum dots on flexible-transparent substrate
- Estudo de estruturas submicrometricas auto-organizadas de copolimeros
- Estruturas de copolímeros sub-micrometricas utilizadas em processo de litografia
- Morphological characterization of PPV multilayer by AFM technique
- Soft-lithography usando copolímero tribloco
- Accessing 3D dimension on a wedding cake like SEBS block copolymer droplet
- Fabrication of mesoscopic block copolymer regular structures by dewetting and phase separation
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