Effect of plasma etching, carbon concentration, and buffer layer on the properties of a-'SI': h / a-'SI IND.1-X''C IND.X' : h multilayers - Velasquez, E L Z; Fantini, Márcia Carvalho de Abreu; Páez Carreño, Marcelo Nelson; Pereyra, Inés; Takahashi, H; Landers, R (Journal of Applied Physics, 1994)