@article{article3c7a466f,
title   = {TCAD Strain Calibration Versus Nanobeam Diffraction of Source/Drain Stressors for Ge MOSFETs},
author = {Bühler, Rudolf Theoderich and Vincent, Benjamin and Witters, Liesbeth J and Favia, Paola and Eneman, Geert and Martino, João Antonio},
year = {2015},
doi = {10.1109/ted.2015.2397441},
journal   = {IEEE Transactions on Electron Devices}
}