@article{article7c8f76fe,
title   = {Advantages of different source/drain engineering on scaled UTBOX FDSOI nMOSFETs at high temperature operation},
author = {Nicoletti, Talitha and Santos, Sara Dereste dos and Martino, João Antonio and Aoulaiche, Marc and Veloso, Anabela and Claeys, Cor and Simoen, Eddy and Jurczak, Malgorzata},
year = {2014},
doi = {10.1016/j.sse.2013.09.012},
journal   = {Solid-State Electronics}
}