@article{articlef16b67b6,
title   = {On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films},
author = {Alayo Chávez, Marco Isaías and Pereyra, Inés and Scopel, Wanderla Luis and Fantini, Márcia Carvalho de Abreu},
year = {2002},
doi = {10.1016/S0040-6090(01)01685-6},
journal   = {Thin Solid Films}
}