@inproceedings{inproceedings273a1447,
title   = {Influence of the pecvd reactor architecture in deposition parameters in the structural and electrical characteristics of the a-'SI': h films},
author = {Bottecchia, J P and Andrade, Adnei Melges de},
year = {1995},
publisher = {Instituto de Informatica da Ufrgs},
booktitle   = {Congress of the Brazilian Microelectronics Society}
}