@inproceedings{inproceedings4619ed9a,
title   = {Silicon surface roughening induced by CBrF3 plasma during the reactive ion etching},
author = {Yamamoto, R K and Lopes, M C V and Akamine, C T and Santos Filho, Sebastião Gomes dos and Hasenack, Claus Martin},
year = {1992},
publisher = {Unicamp/Cbecimat},
booktitle   = {Congresso Brasileiro de Engenharia e Ciencia dos Materiais}
}