Aluminium etching with cc14-n2 plasmas (1996)
Source: Proceedings. Conference titles: Conference of the Brazilian Microelectronics Society. Unidade: EP
Assunto: SEMICONDUTORES
ABNT
NAKAZAWA, Angela Makie e VERDONCK, Patrick Bernard. Aluminium etching with cc14-n2 plasmas. 1996, Anais.. São Paulo: Sbmicro, 1996. . Acesso em: 12 nov. 2025.APA
Nakazawa, A. M., & Verdonck, P. B. (1996). Aluminium etching with cc14-n2 plasmas. In Proceedings. São Paulo: Sbmicro.NLM
Nakazawa AM, Verdonck PB. Aluminium etching with cc14-n2 plasmas. Proceedings. 1996 ;[citado 2025 nov. 12 ]Vancouver
Nakazawa AM, Verdonck PB. Aluminium etching with cc14-n2 plasmas. Proceedings. 1996 ;[citado 2025 nov. 12 ]
