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Filtros : "Microelectronics Technology and Devices SBMICRO 2002" "Swart, Jacobus Willibrordus" Limpar

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  • Parte de monografia/livro

    Formation and characterization of the Ni(Pt)Si and NiSi for MOS devices applications (2002)

    Santos, R.E.; Doi, Ioshiaki; Diniz, J. A.; Swart, Jacobus Willibrordus; Santos Filho, Sebastião Gomes dos

    Source: Microelectronics Technology and Devices SBMICRO 2002. Unidade: EP

    Assunto: MICROELETRÔNICA

    How to cite
    A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas

    • ABNT

      SANTOS, R.E. et al. Formation and characterization of the Ni(Pt)Si and NiSi for MOS devices applications. Microelectronics Technology and Devices SBMICRO 2002. Tradução . Pennington: The Electrochemical Society, 2002. . . Acesso em: 16 nov. 2025.

    • APA

      Santos, R. E., Doi, I., Diniz, J. A., Swart, J. W., & Santos Filho, S. G. dos. (2002). Formation and characterization of the Ni(Pt)Si and NiSi for MOS devices applications. In Microelectronics Technology and Devices SBMICRO 2002. Pennington: The Electrochemical Society.

    • NLM

      Santos RE, Doi I, Diniz JA, Swart JW, Santos Filho SG dos. Formation and characterization of the Ni(Pt)Si and NiSi for MOS devices applications. In: Microelectronics Technology and Devices SBMICRO 2002. Pennington: The Electrochemical Society; 2002. [citado 2025 nov. 16 ]

    • Vancouver

      Santos RE, Doi I, Diniz JA, Swart JW, Santos Filho SG dos. Formation and characterization of the Ni(Pt)Si and NiSi for MOS devices applications. In: Microelectronics Technology and Devices SBMICRO 2002. Pennington: The Electrochemical Society; 2002. [citado 2025 nov. 16 ]

  • Parte de monografia/livro

    Formation of nickel monosilicide onto (100) silicon wafer surfaces (2002)

    Reis, Ronaldo Willian; Santos Filho, Sebastião Gomes dos ; Laganá, Armando Antonio Maria ; Doi, Ioshiaki; Swart, Jacobus Willibrordus

    Source: Microelectronics Technology and Devices SBMICRO 2002. Unidade: EP

    Assunto: MICROELETRÔNICA

    How to cite
    A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas

    • ABNT

      REIS, Ronaldo Willian et al. Formation of nickel monosilicide onto (100) silicon wafer surfaces. Microelectronics Technology and Devices SBMICRO 2002. Tradução . Pennington: The Electrochemical Society, 2002. . . Acesso em: 16 nov. 2025.

    • APA

      Reis, R. W., Santos Filho, S. G. dos, Laganá, A. A. M., Doi, I., & Swart, J. W. (2002). Formation of nickel monosilicide onto (100) silicon wafer surfaces. In Microelectronics Technology and Devices SBMICRO 2002. Pennington: The Electrochemical Society.

    • NLM

      Reis RW, Santos Filho SG dos, Laganá AAM, Doi I, Swart JW. Formation of nickel monosilicide onto (100) silicon wafer surfaces. In: Microelectronics Technology and Devices SBMICRO 2002. Pennington: The Electrochemical Society; 2002. [citado 2025 nov. 16 ]

    • Vancouver

      Reis RW, Santos Filho SG dos, Laganá AAM, Doi I, Swart JW. Formation of nickel monosilicide onto (100) silicon wafer surfaces. In: Microelectronics Technology and Devices SBMICRO 2002. Pennington: The Electrochemical Society; 2002. [citado 2025 nov. 16 ]
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