Deposition and characterization of indium-tin oxide thin films deposited by RF sputtering (2007)
Damiani, Larissa Rodrigues; Mansano, Ronaldo Domingues 
Fonte: SBMicro 2007. Nome do evento: International Symposium on Microelectronics Technology and Devices SBMICRO. Unidade: EP
Assuntos: MICROELETRÔNICA, FILMES FINOS
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DAMIANI, Larissa Rodrigues e MANSANO, Ronaldo Domingues. Deposition and characterization of indium-tin oxide thin films deposited by RF sputtering. 2007, Anais.. Pennington: The Electrochemical Society, 2007. . Acesso em: 15 nov. 2025.APA
Damiani, L. R., & Mansano, R. D. (2007). Deposition and characterization of indium-tin oxide thin films deposited by RF sputtering. In SBMicro 2007. Pennington: The Electrochemical Society.NLM
Damiani LR, Mansano RD. Deposition and characterization of indium-tin oxide thin films deposited by RF sputtering. SBMicro 2007. 2007 ;[citado 2025 nov. 15 ]Vancouver
Damiani LR, Mansano RD. Deposition and characterization of indium-tin oxide thin films deposited by RF sputtering. SBMicro 2007. 2007 ;[citado 2025 nov. 15 ]
