Tan, Ing Hwie; Ueda, Mário; Dallaqua, Renato Sergio; Rossi, José Osvaldo; Beloto, Antonio Fernando; Demarquette, Nicole Raymonde 
; Gengembre, Leon
Fonte: Japanese Journal of Applied Physics. Unidade: EP
Assuntos: PLASMA, POLÍMEROS (MATERIAIS), VÁCUO, OXIDAÇÃO
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TAN, Ing Hwie et al. Aluminum implantation in Kapton for space applications magnetic field effects on implantation in vacuum arcs. Japanese Journal of Applied Physics, v. 44, n. 7A, p. 5211-5215, 2005Tradução . . Disponível em: https://repositorio.usp.br/directbitstream/78384fe4-33bb-4472-b2f7-e1351194a3ab/DEMARQUETTE-2005-Aluminum_Implantation.pdf. Acesso em: 17 nov. 2025.APA
Tan, I. H., Ueda, M., Dallaqua, R. S., Rossi, J. O., Beloto, A. F., Demarquette, N. R., & Gengembre, L. (2005). Aluminum implantation in Kapton for space applications magnetic field effects on implantation in vacuum arcs. Japanese Journal of Applied Physics, 44( 7A), 5211-5215. Recuperado de https://repositorio.usp.br/directbitstream/78384fe4-33bb-4472-b2f7-e1351194a3ab/DEMARQUETTE-2005-Aluminum_Implantation.pdfNLM
Tan IH, Ueda M, Dallaqua RS, Rossi JO, Beloto AF, Demarquette NR, Gengembre L. Aluminum implantation in Kapton for space applications magnetic field effects on implantation in vacuum arcs [Internet]. Japanese Journal of Applied Physics. 2005 ;44( 7A): 5211-5215.[citado 2025 nov. 17 ] Available from: https://repositorio.usp.br/directbitstream/78384fe4-33bb-4472-b2f7-e1351194a3ab/DEMARQUETTE-2005-Aluminum_Implantation.pdfVancouver
Tan IH, Ueda M, Dallaqua RS, Rossi JO, Beloto AF, Demarquette NR, Gengembre L. Aluminum implantation in Kapton for space applications magnetic field effects on implantation in vacuum arcs [Internet]. Japanese Journal of Applied Physics. 2005 ;44( 7A): 5211-5215.[citado 2025 nov. 17 ] Available from: https://repositorio.usp.br/directbitstream/78384fe4-33bb-4472-b2f7-e1351194a3ab/DEMARQUETTE-2005-Aluminum_Implantation.pdf
