Tan, Ing Hwie; Ueda, Mário; Dallaqua, Renato Sergio; Rossi, José Osvaldo; Beloto, Antonio Fernando; Demarquette, Nicole Raymonde 
; Gengembre, Leon
Source: Japanese Journal of Applied Physics. Unidade: EP
Subjects: PLASMA, POLÍMEROS (MATERIAIS), VÁCUO, OXIDAÇÃO
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ABNT
TAN, Ing Hwie et al. Aluminum implantation in Kapton for space applications magnetic field effects on implantation in vacuum arcs. Japanese Journal of Applied Physics, v. 44, n. 7A, p. 5211-5215, 2005Tradução . . Disponível em: https://repositorio.usp.br/directbitstream/78384fe4-33bb-4472-b2f7-e1351194a3ab/DEMARQUETTE-2005-Aluminum_Implantation.pdf. Acesso em: 17 nov. 2025.APA
Tan, I. H., Ueda, M., Dallaqua, R. S., Rossi, J. O., Beloto, A. F., Demarquette, N. R., & Gengembre, L. (2005). Aluminum implantation in Kapton for space applications magnetic field effects on implantation in vacuum arcs. Japanese Journal of Applied Physics, 44( 7A), 5211-5215. Recuperado de https://repositorio.usp.br/directbitstream/78384fe4-33bb-4472-b2f7-e1351194a3ab/DEMARQUETTE-2005-Aluminum_Implantation.pdfNLM
Tan IH, Ueda M, Dallaqua RS, Rossi JO, Beloto AF, Demarquette NR, Gengembre L. Aluminum implantation in Kapton for space applications magnetic field effects on implantation in vacuum arcs [Internet]. Japanese Journal of Applied Physics. 2005 ;44( 7A): 5211-5215.[citado 2025 nov. 17 ] Available from: https://repositorio.usp.br/directbitstream/78384fe4-33bb-4472-b2f7-e1351194a3ab/DEMARQUETTE-2005-Aluminum_Implantation.pdfVancouver
Tan IH, Ueda M, Dallaqua RS, Rossi JO, Beloto AF, Demarquette NR, Gengembre L. Aluminum implantation in Kapton for space applications magnetic field effects on implantation in vacuum arcs [Internet]. Japanese Journal of Applied Physics. 2005 ;44( 7A): 5211-5215.[citado 2025 nov. 17 ] Available from: https://repositorio.usp.br/directbitstream/78384fe4-33bb-4472-b2f7-e1351194a3ab/DEMARQUETTE-2005-Aluminum_Implantation.pdf
