SU-8 low contrast process for multi-level e-beam lithography (2005)
Catelli, R; Seabra, Antonio Carlos 
Fonte: Microelectronics Technology and Devices SBMICRO 2005. Nome do evento: International Symposium on Microelectronics Technology and Devices SBMICRO. Unidade: EP
Assunto: MICROELETRÔNICA
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ABNT
CATELLI, R e SEABRA, Antonio Carlos. SU-8 low contrast process for multi-level e-beam lithography. 2005, Anais.. Pennington: The Electrochemical Society, 2005. . Acesso em: 16 nov. 2025.APA
Catelli, R., & Seabra, A. C. (2005). SU-8 low contrast process for multi-level e-beam lithography. In Microelectronics Technology and Devices SBMICRO 2005. Pennington: The Electrochemical Society.NLM
Catelli R, Seabra AC. SU-8 low contrast process for multi-level e-beam lithography. Microelectronics Technology and Devices SBMICRO 2005. 2005 ;[citado 2025 nov. 16 ]Vancouver
Catelli R, Seabra AC. SU-8 low contrast process for multi-level e-beam lithography. Microelectronics Technology and Devices SBMICRO 2005. 2005 ;[citado 2025 nov. 16 ]
