Sato, Roseli Hiromi 
; Kosaka, Priscila Monteiro ; Omori, Álvaro Takeo ; Ferreira, Edgard Antonio ; Petri, Denise Freitas Siqueira ; Malvar, Óscar ; Domínguez, Carmen M ; Pini, Valerio ; Ahumada, Óscar; Tamayo, Javier ; Calleja, Montserrat ; Cunha, Rodrigo Luiz Oliveira Rodrigues ; Fiorito, Pablo A
Fonte: Biosensors and Bioelectronics. Unidade: IQ
Assuntos: CALCOGÊNIOS, TELÚRIO, NANOTECNOLOGIA
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SATO, Roseli Hiromi et al. Development of a methodology for reversible chemical modification of silicon surfaces with application in nanomechanical biosensors. Biosensors and Bioelectronics, v. 137, p. 287-293, 2019Tradução . . Disponível em: https://doi.org/10.1016/j.bios.2019.04.028. Acesso em: 07 dez. 2025.APA
Sato, R. H., Kosaka, P. M., Omori, Á. T., Ferreira, E. A., Petri, D. F. S., Malvar, Ó., et al. (2019). Development of a methodology for reversible chemical modification of silicon surfaces with application in nanomechanical biosensors. Biosensors and Bioelectronics, 137, 287-293. doi:10.1016/j.bios.2019.04.028NLM
Sato RH, Kosaka PM, Omori ÁT, Ferreira EA, Petri DFS, Malvar Ó, Domínguez CM, Pini V, Ahumada Ó, Tamayo J, Calleja M, Cunha RLOR, Fiorito PA. Development of a methodology for reversible chemical modification of silicon surfaces with application in nanomechanical biosensors [Internet]. Biosensors and Bioelectronics. 2019 ; 137 287-293.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1016/j.bios.2019.04.028Vancouver
Sato RH, Kosaka PM, Omori ÁT, Ferreira EA, Petri DFS, Malvar Ó, Domínguez CM, Pini V, Ahumada Ó, Tamayo J, Calleja M, Cunha RLOR, Fiorito PA. Development of a methodology for reversible chemical modification of silicon surfaces with application in nanomechanical biosensors [Internet]. Biosensors and Bioelectronics. 2019 ; 137 287-293.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1016/j.bios.2019.04.028
