Application of fluorine based plasma etching processes in microfluidic device fabrication (2000)
Mansano, Ronaldo Domingues 
; Verdonck, Patrick Bernard; Simões, Eliphas Wagner; Furlan, Rogério
Fonte: Journal of Solid-State Devices and Circuits. Unidade: EP
Assunto: CIRCUITOS ELETRÔNICOS
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MANSANO, Ronaldo Domingues et al. Application of fluorine based plasma etching processes in microfluidic device fabrication. Journal of Solid-State Devices and Circuits, v. 8, n. 1, p. 5-9, 2000Tradução . . Acesso em: 16 nov. 2025.APA
Mansano, R. D., Verdonck, P. B., Simões, E. W., & Furlan, R. (2000). Application of fluorine based plasma etching processes in microfluidic device fabrication. Journal of Solid-State Devices and Circuits, 8( 1), 5-9.NLM
Mansano RD, Verdonck PB, Simões EW, Furlan R. Application of fluorine based plasma etching processes in microfluidic device fabrication. Journal of Solid-State Devices and Circuits. 2000 ; 8( 1): 5-9.[citado 2025 nov. 16 ]Vancouver
Mansano RD, Verdonck PB, Simões EW, Furlan R. Application of fluorine based plasma etching processes in microfluidic device fabrication. Journal of Solid-State Devices and Circuits. 2000 ; 8( 1): 5-9.[citado 2025 nov. 16 ]
