Source: Acta Odontologica Scandinavica. Unidade: ESALQ
Subjects: ADESIVOS DENTINÁRIOS, DENTINA, ESMALTE DENTÁRIO
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ARAÚJO, Cíntia Tereza Pimenta de et al. Influence of photo-curing distance on bond strength and nanoleakage of self-etching adhesive bonds to enamel and dentin. Acta Odontologica Scandinavica, v. 72, n. 2, p. 113-119, 2014Tradução . . Disponível em: https://doi.org/10.3109/00016357.2013.805431. Acesso em: 01 nov. 2024.APA
Araújo, C. T. P. de, Prieto, L. T., Lima, A. F., Souza Junior, E. J., Dias, C. T. dos S., & Paulillo, L. A. M. S. (2014). Influence of photo-curing distance on bond strength and nanoleakage of self-etching adhesive bonds to enamel and dentin. Acta Odontologica Scandinavica, 72( 2), 113-119. doi:10.3109/00016357.2013.805431NLM
Araújo CTP de, Prieto LT, Lima AF, Souza Junior EJ, Dias CT dos S, Paulillo LAMS. Influence of photo-curing distance on bond strength and nanoleakage of self-etching adhesive bonds to enamel and dentin [Internet]. Acta Odontologica Scandinavica. 2014 ; 72( 2): 113-119.[citado 2024 nov. 01 ] Available from: https://doi.org/10.3109/00016357.2013.805431Vancouver
Araújo CTP de, Prieto LT, Lima AF, Souza Junior EJ, Dias CT dos S, Paulillo LAMS. Influence of photo-curing distance on bond strength and nanoleakage of self-etching adhesive bonds to enamel and dentin [Internet]. Acta Odontologica Scandinavica. 2014 ; 72( 2): 113-119.[citado 2024 nov. 01 ] Available from: https://doi.org/10.3109/00016357.2013.805431
