High mobilities by interface roughness in InGaAs/InP heterostructures (2009)
Source: Abstracts. Conference titles: International Conference on the Formation of Semiconductor Interfaces - ICFSI. Unidade: IFSC
Subjects: SEMICONDUTORES, SPIN, DIFRAÇÃO POR RAIOS X, MAGNETISMO, NANOTECNOLOGIA, FÍSICA DE PARTÍCULAS
ABNT
PUSEP, Yuri A et al. High mobilities by interface roughness in InGaAs/InP heterostructures. 2009, Anais.. [S.l.]: Instituto de Física de São Carlos, Universidade de São Paulo, 2009. . Acesso em: 16 nov. 2024.APA
Pusep, Y. A., Gozzo, G. C., La Pierre, R. R., & Gold, A. (2009). High mobilities by interface roughness in InGaAs/InP heterostructures. In Abstracts. [S.l.]: Instituto de Física de São Carlos, Universidade de São Paulo.NLM
Pusep YA, Gozzo GC, La Pierre RR, Gold A. High mobilities by interface roughness in InGaAs/InP heterostructures. Abstracts. 2009 ;[citado 2024 nov. 16 ]Vancouver
Pusep YA, Gozzo GC, La Pierre RR, Gold A. High mobilities by interface roughness in InGaAs/InP heterostructures. Abstracts. 2009 ;[citado 2024 nov. 16 ]