TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage (2011)
Devia, D. M.; Restrepo-Parra, E.; Arango, P. J.; Tschiptschin, André Paulo 
; Velez, Juan Manuel
Fonte: Applied Surface Science. Unidade: EP
Assuntos: CRISTALOGRAFIA, TITÂNIO
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
DEVIA, D. M. et al. TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage. Applied Surface Science, v. 257, n. 14, p. 6181-6185, 2011Tradução . . Disponível em: https://doi.org/10.1016/j.apsusc.2011.02.027. Acesso em: 09 nov. 2025.APA
Devia, D. M., Restrepo-Parra, E., Arango, P. J., Tschiptschin, A. P., & Velez, J. M. (2011). TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage. Applied Surface Science, 257( 14), 6181-6185. doi:10.1016/j.apsusc.2011.02.027NLM
Devia DM, Restrepo-Parra E, Arango PJ, Tschiptschin AP, Velez JM. TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage [Internet]. Applied Surface Science. 2011 ; 257( 14): 6181-6185.[citado 2025 nov. 09 ] Available from: https://doi.org/10.1016/j.apsusc.2011.02.027Vancouver
Devia DM, Restrepo-Parra E, Arango PJ, Tschiptschin AP, Velez JM. TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage [Internet]. Applied Surface Science. 2011 ; 257( 14): 6181-6185.[citado 2025 nov. 09 ] Available from: https://doi.org/10.1016/j.apsusc.2011.02.027
