Characterization of W'O IND. 3': Ag films: ToF-SIMS studies of ammonia adsorption (2005)
Bittencourt, Carla; Felicissimo, M. P.; Felten, A.; Nunes, Luiz Antônio de Oliveira 
; Ivanov, P.; Llobet, E.; Pireaux, Jean-Jacques; Houssiau, Laurent
Source: Applied Surface Science. Unidade: IFSC
Subjects: FILMES FINOS, SEMICONDUTORES, AMÔNIA
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BITTENCOURT, Carla et al. Characterization of W'O IND. 3': Ag films: ToF-SIMS studies of ammonia adsorption. Applied Surface Science, v. 250, n. 1/4, p. 21-28, 2005Tradução . . Acesso em: 09 nov. 2025.APA
Bittencourt, C., Felicissimo, M. P., Felten, A., Nunes, L. A. de O., Ivanov, P., Llobet, E., et al. (2005). Characterization of W'O IND. 3': Ag films: ToF-SIMS studies of ammonia adsorption. Applied Surface Science, 250( 1/4), 21-28.NLM
Bittencourt C, Felicissimo MP, Felten A, Nunes LA de O, Ivanov P, Llobet E, Pireaux J-J, Houssiau L. Characterization of W'O IND. 3': Ag films: ToF-SIMS studies of ammonia adsorption. Applied Surface Science. 2005 ; 250( 1/4): 21-28.[citado 2025 nov. 09 ]Vancouver
Bittencourt C, Felicissimo MP, Felten A, Nunes LA de O, Ivanov P, Llobet E, Pireaux J-J, Houssiau L. Characterization of W'O IND. 3': Ag films: ToF-SIMS studies of ammonia adsorption. Applied Surface Science. 2005 ; 250( 1/4): 21-28.[citado 2025 nov. 09 ]
