Influence of multi-depositions on the final properties of thermally evaporated TlBr films (2010)
Fonte: Nuclear Instruments and Methods in Physics Research A. Unidade: FFCLRP
Assuntos: METAIS, BROMO, SEMICONDUTORES, EVAPORAÇÃO, RADIOGRAFIA
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DESTEFANO, N. e MULATO, Marcelo. Influence of multi-depositions on the final properties of thermally evaporated TlBr films. Nuclear Instruments and Methods in Physics Research A, v. 62, n. 1, p. 114-117, 2010Tradução . . Disponível em: https://doi.org/10.1016/j.nima.2010.09.006. Acesso em: 28 nov. 2025.APA
Destefano, N., & Mulato, M. (2010). Influence of multi-depositions on the final properties of thermally evaporated TlBr films. Nuclear Instruments and Methods in Physics Research A, 62( 1), 114-117. doi:10.1016/j.nima.2010.09.006NLM
Destefano N, Mulato M. Influence of multi-depositions on the final properties of thermally evaporated TlBr films [Internet]. Nuclear Instruments and Methods in Physics Research A. 2010 ; 62( 1): 114-117.[citado 2025 nov. 28 ] Available from: https://doi.org/10.1016/j.nima.2010.09.006Vancouver
Destefano N, Mulato M. Influence of multi-depositions on the final properties of thermally evaporated TlBr films [Internet]. Nuclear Instruments and Methods in Physics Research A. 2010 ; 62( 1): 114-117.[citado 2025 nov. 28 ] Available from: https://doi.org/10.1016/j.nima.2010.09.006
