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Artigo de periodico
A statistical evaluation of the field emission for copper oxide nanostructures (2008)
Rocha, M S F; Santos, T E A; Paulo, A C de; Hering, V R; Daniel den Engelsen; Vuolo, José Henrique; Mammana, S S; Mammana, Victor Pellegrini
Source: Applied Surface Science. Unidade: IF
Assunto: NANOPARTÍCULAS
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ABNT
ROCHA, M S F et al. A statistical evaluation of the field emission for copper oxide nanostructures. Applied Surface Science, v. 254, n. 6, p. 1859-1869, 2008Tradução . . Disponível em: https://doi.org/10.1016/j.apsusc.2007.07.172. Acesso em: 23 nov. 2025.
APA
Rocha, M. S. F., Santos, T. E. A., Paulo, A. C. de, Hering, V. R., Daniel den Engelsen,, Vuolo, J. H., et al. (2008). A statistical evaluation of the field emission for copper oxide nanostructures. Applied Surface Science, 254( 6), 1859-1869. doi:10.1016/j.apsusc.2007.07.172
NLM
Rocha MSF, Santos TEA, Paulo AC de, Hering VR, Daniel den Engelsen, Vuolo JH, Mammana SS, Mammana VP. A statistical evaluation of the field emission for copper oxide nanostructures [Internet]. Applied Surface Science. 2008 ; 254( 6): 1859-1869.[citado 2025 nov. 23 ] Available from: https://doi.org/10.1016/j.apsusc.2007.07.172
Vancouver
Rocha MSF, Santos TEA, Paulo AC de, Hering VR, Daniel den Engelsen, Vuolo JH, Mammana SS, Mammana VP. A statistical evaluation of the field emission for copper oxide nanostructures [Internet]. Applied Surface Science. 2008 ; 254( 6): 1859-1869.[citado 2025 nov. 23 ] Available from: https://doi.org/10.1016/j.apsusc.2007.07.172
Artigo de periodico
Thionin adsorption on silicon (100): structural analysis (2006)
Miotto, R; Cunha, J F R; Silva, S W da; Soler, Maria Aparecida Godoy ; Morais, P C; Ferraz, A. C.; Tada, Dayane B; Petri, Denise Freitas Siqueira ; Baptista, Maurício da Silva
Source: Applied Surface Science. Unidades: IF, IQ
Subjects: SUPERFÍCIE FÍSICA, ESPECTROSCOPIA RAMAN
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ABNT
MIOTTO, R et al. Thionin adsorption on silicon (100): structural analysis. Applied Surface Science, v. 253, n. 4, p. 1978-1982, 2006Tradução . . Disponível em: http://www.sciencedirect.com/science?_ob=MImg&_imagekey=B6THY-4JVSV81-8-21&_cdi=5295&_user=972067&_orig=browse&_coverDate=12%2F15%2F2006&_sk=997469995&view=c&wchp=dGLbVlb-zSkzV&md5=acc94b55ddd7242377aad57aa86d3b8d&ie=/sdarticle.pdf. Acesso em: 23 nov. 2025.
APA
Miotto, R., Cunha, J. F. R., Silva, S. W. da, Soler, M. A. G., Morais, P. C., Ferraz, A. C., et al. (2006). Thionin adsorption on silicon (100): structural analysis. Applied Surface Science, 253( 4), 1978-1982. Recuperado de http://www.sciencedirect.com/science?_ob=MImg&_imagekey=B6THY-4JVSV81-8-21&_cdi=5295&_user=972067&_orig=browse&_coverDate=12%2F15%2F2006&_sk=997469995&view=c&wchp=dGLbVlb-zSkzV&md5=acc94b55ddd7242377aad57aa86d3b8d&ie=/sdarticle.pdf
NLM
Miotto R, Cunha JFR, Silva SW da, Soler MAG, Morais PC, Ferraz AC, Tada DB, Petri DFS, Baptista M da S. Thionin adsorption on silicon (100): structural analysis [Internet]. Applied Surface Science. 2006 ; 253( 4): 1978-1982.[citado 2025 nov. 23 ] Available from: http://www.sciencedirect.com/science?_ob=MImg&_imagekey=B6THY-4JVSV81-8-21&_cdi=5295&_user=972067&_orig=browse&_coverDate=12%2F15%2F2006&_sk=997469995&view=c&wchp=dGLbVlb-zSkzV&md5=acc94b55ddd7242377aad57aa86d3b8d&ie=/sdarticle.pdf
Vancouver
Miotto R, Cunha JFR, Silva SW da, Soler MAG, Morais PC, Ferraz AC, Tada DB, Petri DFS, Baptista M da S. Thionin adsorption on silicon (100): structural analysis [Internet]. Applied Surface Science. 2006 ; 253( 4): 1978-1982.[citado 2025 nov. 23 ] Available from: http://www.sciencedirect.com/science?_ob=MImg&_imagekey=B6THY-4JVSV81-8-21&_cdi=5295&_user=972067&_orig=browse&_coverDate=12%2F15%2F2006&_sk=997469995&view=c&wchp=dGLbVlb-zSkzV&md5=acc94b55ddd7242377aad57aa86d3b8d&ie=/sdarticle.pdf
Artigo de periodico
Capacitance dispersion in electrochemical impedance spectroscopy measurements of iodide adsorption on Au(1 1 1) (2006)
Neves, Rodrigo de Santis; De Robertis, Eveline; Motheo, Artur de Jesus
Source: Applied Surface Science. Unidade: IQSC
Assunto: ELETROQUÍMICA
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ABNT
NEVES, Rodrigo de Santis e DE ROBERTIS, Eveline e MOTHEO, Artur de Jesus. Capacitance dispersion in electrochemical impedance spectroscopy measurements of iodide adsorption on Au(1 1 1). Applied Surface Science, v. 253, n. 3, p. 1379-1386, 2006Tradução . . Disponível em: https://doi.org/10.1016/j.apsusc.2006.02.010. Acesso em: 23 nov. 2025.
APA
Neves, R. de S., De Robertis, E., & Motheo, A. de J. (2006). Capacitance dispersion in electrochemical impedance spectroscopy measurements of iodide adsorption on Au(1 1 1). Applied Surface Science, 253( 3), 1379-1386. doi:10.1016/j.apsusc.2006.02.010
NLM
Neves R de S, De Robertis E, Motheo A de J. Capacitance dispersion in electrochemical impedance spectroscopy measurements of iodide adsorption on Au(1 1 1) [Internet]. Applied Surface Science. 2006 ; 253( 3): 1379-1386.[citado 2025 nov. 23 ] Available from: https://doi.org/10.1016/j.apsusc.2006.02.010
Vancouver
Neves R de S, De Robertis E, Motheo A de J. Capacitance dispersion in electrochemical impedance spectroscopy measurements of iodide adsorption on Au(1 1 1) [Internet]. Applied Surface Science. 2006 ; 253( 3): 1379-1386.[citado 2025 nov. 23 ] Available from: https://doi.org/10.1016/j.apsusc.2006.02.010
Artigo de periodico
Carbon nanotube adsorbed on hydrogenated Si(0 0 1) surfaces (2005)
Miwa, R H; Orellana, W; Fazzio, Adalberto
Source: Applied Surface Science. Unidade: IF
Subjects: MATÉRIA CONDENSADA, SUPERFÍCIE FÍSICA
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ABNT
MIWA, R H e ORELLANA, W e FAZZIO, Adalberto. Carbon nanotube adsorbed on hydrogenated Si(0 0 1) surfaces. Applied Surface Science, v. 244, p. 124-128, 2005Tradução . . Disponível em: https://doi.org/10.1016/j.apsusc.2004.09.165. Acesso em: 23 nov. 2025.
APA
Miwa, R. H., Orellana, W., & Fazzio, A. (2005). Carbon nanotube adsorbed on hydrogenated Si(0 0 1) surfaces. Applied Surface Science, 244, 124-128. doi:10.1016/j.apsusc.2004.09.165
NLM
Miwa RH, Orellana W, Fazzio A. Carbon nanotube adsorbed on hydrogenated Si(0 0 1) surfaces [Internet]. Applied Surface Science. 2005 ; 244 124-128.[citado 2025 nov. 23 ] Available from: https://doi.org/10.1016/j.apsusc.2004.09.165
Vancouver
Miwa RH, Orellana W, Fazzio A. Carbon nanotube adsorbed on hydrogenated Si(0 0 1) surfaces [Internet]. Applied Surface Science. 2005 ; 244 124-128.[citado 2025 nov. 23 ] Available from: https://doi.org/10.1016/j.apsusc.2004.09.165
Artigo de periodico
The influence of oxygen in the photoexpansion of GaGeS glasses (2003)
Messaddeq, Sandra H.; Mastelaro, Valmor Roberto ; Siu Li, Máximo ; Tabacniks, Manfredo Harri ; Lezal, D.; Ramos, A.; Messaddeq, Y.
Source: Applied Surface Science. Unidades: IFSC, IF
Subjects: ÓPTICA, ESPECTROSCOPIA DE RAIO X, FILMES FINOS, VIDRO
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ABNT
MESSADDEQ, Sandra H. et al. The influence of oxygen in the photoexpansion of GaGeS glasses. Applied Surface Science, v. 205, n. Ja, p. 143-150, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0169-4332(02)01013-9. Acesso em: 23 nov. 2025.
APA
Messaddeq, S. H., Mastelaro, V. R., Siu Li, M., Tabacniks, M. H., Lezal, D., Ramos, A., & Messaddeq, Y. (2003). The influence of oxygen in the photoexpansion of GaGeS glasses. Applied Surface Science, 205( Ja), 143-150. doi:10.1016/s0169-4332(02)01013-9
NLM
Messaddeq SH, Mastelaro VR, Siu Li M, Tabacniks MH, Lezal D, Ramos A, Messaddeq Y. The influence of oxygen in the photoexpansion of GaGeS glasses [Internet]. Applied Surface Science. 2003 ; 205( Ja): 143-150.[citado 2025 nov. 23 ] Available from: https://doi.org/10.1016/s0169-4332(02)01013-9
Vancouver
Messaddeq SH, Mastelaro VR, Siu Li M, Tabacniks MH, Lezal D, Ramos A, Messaddeq Y. The influence of oxygen in the photoexpansion of GaGeS glasses [Internet]. Applied Surface Science. 2003 ; 205( Ja): 143-150.[citado 2025 nov. 23 ] Available from: https://doi.org/10.1016/s0169-4332(02)01013-9
Artigo de periodico
Passivation of InP(001) by sulfur (1999)
Ferraz, A. C.; Srivastava, G. P.
Source: Applied Surface Science. Unidade: IF
Assunto: MATÉRIA CONDENSADA
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ABNT
FERRAZ, A. C. e SRIVASTAVA, G. P. Passivation of InP(001) by sulfur. Applied Surface Science, v. 142, n. 1-4, p. 23-27, 1999Tradução . . Disponível em: https://doi.org/10.1016/s0169-4332(98)00732-6. Acesso em: 23 nov. 2025.
APA
Ferraz, A. C., & Srivastava, G. P. (1999). Passivation of InP(001) by sulfur. Applied Surface Science, 142( 1-4), 23-27. doi:10.1016/s0169-4332(98)00732-6
NLM
Ferraz AC, Srivastava GP. Passivation of InP(001) by sulfur [Internet]. Applied Surface Science. 1999 ; 142( 1-4): 23-27.[citado 2025 nov. 23 ] Available from: https://doi.org/10.1016/s0169-4332(98)00732-6
Vancouver
Ferraz AC, Srivastava GP. Passivation of InP(001) by sulfur [Internet]. Applied Surface Science. 1999 ; 142( 1-4): 23-27.[citado 2025 nov. 23 ] Available from: https://doi.org/10.1016/s0169-4332(98)00732-6

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