Diamond growth on silicon nitride by microwave plasma chemical vapor deposition (1992)
Source: Diamond and Related Materials. Unidade: IF
Assunto: FÍSICO-QUÍMICA
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SALVADORI, M C e AGER III, J W e BROWN, I G. Diamond growth on silicon nitride by microwave plasma chemical vapor deposition. Diamond and Related Materials, v. 1 , p. 818-3, 1992Tradução . . Disponível em: https://doi.org/10.1016/0925-9635(92)90107-y. Acesso em: 07 set. 2024.APA
Salvadori, M. C., Ager Iii, J. W., & Brown, I. G. (1992). Diamond growth on silicon nitride by microwave plasma chemical vapor deposition. Diamond and Related Materials, 1 , 818-3. doi:10.1016/0925-9635(92)90107-yNLM
Salvadori MC, Ager Iii JW, Brown IG. Diamond growth on silicon nitride by microwave plasma chemical vapor deposition [Internet]. Diamond and Related Materials. 1992 ;1 818-3.[citado 2024 set. 07 ] Available from: https://doi.org/10.1016/0925-9635(92)90107-yVancouver
Salvadori MC, Ager Iii JW, Brown IG. Diamond growth on silicon nitride by microwave plasma chemical vapor deposition [Internet]. Diamond and Related Materials. 1992 ;1 818-3.[citado 2024 set. 07 ] Available from: https://doi.org/10.1016/0925-9635(92)90107-y
