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Artigo de periodico
Highly efficient holograms based on c-Si metasurfaces in the visible range (2018)
Martins, Augusto; Juntao, Li; Mota, Achiles F. da; Yin, Wang; Gonçalves Neto, Luiz; Carmo, João P.; Teixeira, Fernando L.; Martins, Emiliano R.; Borges, Ben-Hur Viana
Source: Optics Express. Unidade: EESC
Subjects: HOLOGRAMAS, DIFRAÇÃO POR RAIOS X, ENGENHARIA ELÉTRICA
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ABNT
MARTINS, Augusto et al. Highly efficient holograms based on c-Si metasurfaces in the visible range. Optics Express, v. 26, n. 8, p. 9573-9583, 2018Tradução . . Disponível em: https://doi.org/10.1364/OE.26.009573. Acesso em: 09 out. 2024.
APA
Martins, A., Juntao, L., Mota, A. F. da, Yin, W., Gonçalves Neto, L., Carmo, J. P., et al. (2018). Highly efficient holograms based on c-Si metasurfaces in the visible range. Optics Express, 26( 8), 9573-9583. doi:10.1364/OE.26.009573
NLM
Martins A, Juntao L, Mota AF da, Yin W, Gonçalves Neto L, Carmo JP, Teixeira FL, Martins ER, Borges B-HV. Highly efficient holograms based on c-Si metasurfaces in the visible range [Internet]. Optics Express. 2018 ; 26( 8): 9573-9583.[citado 2024 out. 09 ] Available from: https://doi.org/10.1364/OE.26.009573
Vancouver
Martins A, Juntao L, Mota AF da, Yin W, Gonçalves Neto L, Carmo JP, Teixeira FL, Martins ER, Borges B-HV. Highly efficient holograms based on c-Si metasurfaces in the visible range [Internet]. Optics Express. 2018 ; 26( 8): 9573-9583.[citado 2024 out. 09 ] Available from: https://doi.org/10.1364/OE.26.009573
Artigo de periodico
Broadband c-Si metasurfaces with polarization control at visible wavelengths: applications to 3D stereoscopic holography (2018)
Martins, Augusto; Juntao, Li; Mota, Achiles F. da; Pepino, Vinicius M.; Yin, Wang; Gonçalves Neto, Luiz; Teixeira, Fernando L.; Martins, Emiliano R.; Borges, Ben-Hur Viana
Source: Optics Express. Unidade: EESC
Subjects: TERCEIRA DIMENSÃO, ENGENHARIA ELÉTRICA, ESTEREOSCOPIA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
MARTINS, Augusto et al. Broadband c-Si metasurfaces with polarization control at visible wavelengths: applications to 3D stereoscopic holography. Optics Express, v. 26, n. 23, p. 30740-30752, 2018Tradução . . Disponível em: https://doi.org/10.1364/OE.26.030740. Acesso em: 09 out. 2024.
APA
Martins, A., Juntao, L., Mota, A. F. da, Pepino, V. M., Yin, W., Gonçalves Neto, L., et al. (2018). Broadband c-Si metasurfaces with polarization control at visible wavelengths: applications to 3D stereoscopic holography. Optics Express, 26( 23), 30740-30752. doi:10.1364/OE.26.030740
NLM
Martins A, Juntao L, Mota AF da, Pepino VM, Yin W, Gonçalves Neto L, Teixeira FL, Martins ER, Borges B-HV. Broadband c-Si metasurfaces with polarization control at visible wavelengths: applications to 3D stereoscopic holography [Internet]. Optics Express. 2018 ; 26( 23): 30740-30752.[citado 2024 out. 09 ] Available from: https://doi.org/10.1364/OE.26.030740
Vancouver
Martins A, Juntao L, Mota AF da, Pepino VM, Yin W, Gonçalves Neto L, Teixeira FL, Martins ER, Borges B-HV. Broadband c-Si metasurfaces with polarization control at visible wavelengths: applications to 3D stereoscopic holography [Internet]. Optics Express. 2018 ; 26( 23): 30740-30752.[citado 2024 out. 09 ] Available from: https://doi.org/10.1364/OE.26.030740
Artigo de periodico
Efficient band-pass color filters enabled by resonant modes and plasmons near the Rayleigh anomaly (2014)
Mazulquim, Daniel Baladelli; Kyu, Jin Lee; Jae, Woong Yoon; Muniz, Leone Veiga; Borges, Ben-Hur Viana; Gonçalves Neto, Luiz; Magnusson, Robert
Source: Optics Express. Unidade: EESC
Subjects: TELECOMUNICAÇÕES, FILTRAÇÃO
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
MAZULQUIM, Daniel Baladelli et al. Efficient band-pass color filters enabled by resonant modes and plasmons near the Rayleigh anomaly. Optics Express, v. 22, n. 25, p. 30843-30851, 2014Tradução . . Disponível em: https://doi.org/10.1364/OE.22.030843. Acesso em: 09 out. 2024.
APA
Mazulquim, D. B., Kyu, J. L., Jae, W. Y., Muniz, L. V., Borges, B. -H. V., Gonçalves Neto, L., & Magnusson, R. (2014). Efficient band-pass color filters enabled by resonant modes and plasmons near the Rayleigh anomaly. Optics Express, 22( 25), 30843-30851. doi:10.1364/OE.22.030843
NLM
Mazulquim DB, Kyu JL, Jae WY, Muniz LV, Borges B-HV, Gonçalves Neto L, Magnusson R. Efficient band-pass color filters enabled by resonant modes and plasmons near the Rayleigh anomaly [Internet]. Optics Express. 2014 ; 22( 25): 30843-30851.[citado 2024 out. 09 ] Available from: https://doi.org/10.1364/OE.22.030843
Vancouver
Mazulquim DB, Kyu JL, Jae WY, Muniz LV, Borges B-HV, Gonçalves Neto L, Magnusson R. Efficient band-pass color filters enabled by resonant modes and plasmons near the Rayleigh anomaly [Internet]. Optics Express. 2014 ; 22( 25): 30843-30851.[citado 2024 out. 09 ] Available from: https://doi.org/10.1364/OE.22.030843
Artigo de periodico
Diffractive phase-shift lithography photomask operating in proximity printing mode (2010)
Cirino, Giuseppe Antonio; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Cescato, Lucila; Gonçalves Neto, Luiz
Source: Optics Express. Unidades: EP, EESC
Subjects: HOLOGRAMAS, ÓPTICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
CIRINO, Giuseppe Antonio et al. Diffractive phase-shift lithography photomask operating in proximity printing mode. Optics Express, v. 18, n. 16, p. 16387-16405, 2010Tradução . . Disponível em: https://doi.org/10.1364/OE.18.016387. Acesso em: 09 out. 2024.
APA
Cirino, G. A., Mansano, R. D., Verdonck, P. B., Cescato, L., & Gonçalves Neto, L. (2010). Diffractive phase-shift lithography photomask operating in proximity printing mode. Optics Express, 18( 16), 16387-16405. doi:10.1364/OE.18.016387
NLM
Cirino GA, Mansano RD, Verdonck PB, Cescato L, Gonçalves Neto L. Diffractive phase-shift lithography photomask operating in proximity printing mode [Internet]. Optics Express. 2010 ; 18( 16): 16387-16405.[citado 2024 out. 09 ] Available from: https://doi.org/10.1364/OE.18.016387
Vancouver
Cirino GA, Mansano RD, Verdonck PB, Cescato L, Gonçalves Neto L. Diffractive phase-shift lithography photomask operating in proximity printing mode [Internet]. Optics Express. 2010 ; 18( 16): 16387-16405.[citado 2024 out. 09 ] Available from: https://doi.org/10.1364/OE.18.016387

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