Fonte: Surface and Coatings Technology. Unidade: IF
Assuntos: FILMES FINOS, ESTRUTURA ELETRÔNICA
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MATSUOKA, Masao et al. X-ray photoelectron spectroscopy analysis of zirconium nitride-like filmsprepared on Si(100) substrates by ion beam assisted deposition. Surface and Coatings Technology, 2008Tradução . . Disponível em: https://doi.org/10.1016/j.surfcoat.2007.11.019. Acesso em: 04 nov. 2025.APA
Matsuoka, M., Isotani, S., Mamani, W. A. S., Kuratani, N., & Ogata, K. (2008). X-ray photoelectron spectroscopy analysis of zirconium nitride-like filmsprepared on Si(100) substrates by ion beam assisted deposition. Surface and Coatings Technology. doi:10.1016/j.surfcoat.2007.11.019NLM
Matsuoka M, Isotani S, Mamani WAS, Kuratani N, Ogata K. X-ray photoelectron spectroscopy analysis of zirconium nitride-like filmsprepared on Si(100) substrates by ion beam assisted deposition [Internet]. Surface and Coatings Technology. 2008 ;[citado 2025 nov. 04 ] Available from: https://doi.org/10.1016/j.surfcoat.2007.11.019Vancouver
Matsuoka M, Isotani S, Mamani WAS, Kuratani N, Ogata K. X-ray photoelectron spectroscopy analysis of zirconium nitride-like filmsprepared on Si(100) substrates by ion beam assisted deposition [Internet]. Surface and Coatings Technology. 2008 ;[citado 2025 nov. 04 ] Available from: https://doi.org/10.1016/j.surfcoat.2007.11.019
