Fonte: Physical Review B. Unidade: IF
Assuntos: SEMICONDUTORES, ESTRUTURA ELETRÔNICA
ABNT
SCOPEL, Wanderlã Luis e SILVA, Antonio Jose Roque da e FAZZIO, Adalberto. Hf defects in c-Si and their importance for the 'HfO IND.2/Si interface: density-functional calculations. Physical Review B, v. 75, n. 19, p. 193203/1-193203/4, 2007Tradução . . Disponível em: http://scitation.aip.org/getpdf/servlet/GetPDFServlet?filetype=pdf&id=PRBMDO000075000019193203000001&idtype=cvips&prog=normal. Acesso em: 07 nov. 2025.APA
Scopel, W. L., Silva, A. J. R. da, & Fazzio, A. (2007). Hf defects in c-Si and their importance for the 'HfO IND.2/Si interface: density-functional calculations. Physical Review B, 75( 19), 193203/1-193203/4. Recuperado de http://scitation.aip.org/getpdf/servlet/GetPDFServlet?filetype=pdf&id=PRBMDO000075000019193203000001&idtype=cvips&prog=normalNLM
Scopel WL, Silva AJR da, Fazzio A. Hf defects in c-Si and their importance for the 'HfO IND.2/Si interface: density-functional calculations [Internet]. Physical Review B. 2007 ; 75( 19): 193203/1-193203/4.[citado 2025 nov. 07 ] Available from: http://scitation.aip.org/getpdf/servlet/GetPDFServlet?filetype=pdf&id=PRBMDO000075000019193203000001&idtype=cvips&prog=normalVancouver
Scopel WL, Silva AJR da, Fazzio A. Hf defects in c-Si and their importance for the 'HfO IND.2/Si interface: density-functional calculations [Internet]. Physical Review B. 2007 ; 75( 19): 193203/1-193203/4.[citado 2025 nov. 07 ] Available from: http://scitation.aip.org/getpdf/servlet/GetPDFServlet?filetype=pdf&id=PRBMDO000075000019193203000001&idtype=cvips&prog=normal
