Internal and external proximity effects in a focused electron-beam nanolithography (1994)
Source: Resumos. Conference titles: Encontro Nacional de Fisica da Materia Condensada. Unidade: IFSC
Subjects: MATÉRIA CONDENSADA, MATÉRIA CONDENSADA
ABNT
SILVA, Marcelo de Assumpção Pereira da et al. Internal and external proximity effects in a focused electron-beam nanolithography. 1994, Anais.. São Paulo: Sociedade Brasileira de Fisica, 1994. . Acesso em: 20 abr. 2024.APA
Silva, M. de A. P. da, Rossi, J. C., Basmaji, P., Aegerter, M. A., Nastaushev, Y. V., & Gusev, G. M. (1994). Internal and external proximity effects in a focused electron-beam nanolithography. In Resumos. São Paulo: Sociedade Brasileira de Fisica.NLM
Silva M de AP da, Rossi JC, Basmaji P, Aegerter MA, Nastaushev YV, Gusev GM. Internal and external proximity effects in a focused electron-beam nanolithography. Resumos. 1994 ;[citado 2024 abr. 20 ]Vancouver
Silva M de AP da, Rossi JC, Basmaji P, Aegerter MA, Nastaushev YV, Gusev GM. Internal and external proximity effects in a focused electron-beam nanolithography. Resumos. 1994 ;[citado 2024 abr. 20 ]