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Filtros : "Journal of the Electrochemical Society" Limpar

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  • Artigo de periodico

    Displocement deposition of sm from fluoride solutions on pd predeposited (100) si substrate (1997)

    Longo, C; Sumodjo, P T A; Sanz, F

    Source: Journal of the Electrochemical Society. Unidade: IQ

    Assunto: FÍSICO-QUÍMICA

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    • ABNT

      LONGO, C e SUMODJO, P T A e SANZ, F. Displocement deposition of sm from fluoride solutions on pd predeposited (100) si substrate. Journal of the Electrochemical Society, v. 144, n. 5 , p. 1659-63, 1997Tradução . . Acesso em: 18 abr. 2024.

    • APA

      Longo, C., Sumodjo, P. T. A., & Sanz, F. (1997). Displocement deposition of sm from fluoride solutions on pd predeposited (100) si substrate. Journal of the Electrochemical Society, 144( 5 ), 1659-63.

    • NLM

      Longo C, Sumodjo PTA, Sanz F. Displocement deposition of sm from fluoride solutions on pd predeposited (100) si substrate. Journal of the Electrochemical Society. 1997 ;144( 5 ): 1659-63.[citado 2024 abr. 18 ]

    • Vancouver

      Longo C, Sumodjo PTA, Sanz F. Displocement deposition of sm from fluoride solutions on pd predeposited (100) si substrate. Journal of the Electrochemical Society. 1997 ;144( 5 ): 1659-63.[citado 2024 abr. 18 ]

  • Artigo de periodico

    Competitive pathwais in the electrochemical reduction on citral (1996)

    Andrade, Adalgisa Rodrigues de; Romero, José Ricardo; Boodts, Julien Françoise Coleta

    Source: Journal of the Electrochemical Society. Unidade: FFCLRP

    Assunto: ELETROQUÍMICA

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      ANDRADE, Adalgisa Rodrigues de e ROMERO, José Ricardo e BOODTS, Julien Françoise Coleta. Competitive pathwais in the electrochemical reduction on citral. Journal of the Electrochemical Society, v. 143, n. 8 , p. 2452-7, 1996Tradução . . Acesso em: 18 abr. 2024.

    • APA

      Andrade, A. R. de, Romero, J. R., & Boodts, J. F. C. (1996). Competitive pathwais in the electrochemical reduction on citral. Journal of the Electrochemical Society, 143( 8 ), 2452-7.

    • NLM

      Andrade AR de, Romero JR, Boodts JFC. Competitive pathwais in the electrochemical reduction on citral. Journal of the Electrochemical Society. 1996 ;143( 8 ): 2452-7.[citado 2024 abr. 18 ]

    • Vancouver

      Andrade AR de, Romero JR, Boodts JFC. Competitive pathwais in the electrochemical reduction on citral. Journal of the Electrochemical Society. 1996 ;143( 8 ): 2452-7.[citado 2024 abr. 18 ]

  • Artigo de periodico

    Interpretation of the power response of a fuel cell with a quadratic logistic differential equation (1996)

    Gonzalez, E R

    Source: Journal of the Electrochemical Society. Unidade: IQSC

    Assunto: QUÍMICA

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    • ABNT

      GONZALEZ, E R. Interpretation of the power response of a fuel cell with a quadratic logistic differential equation. Journal of the Electrochemical Society, v. 143, n. ju 1996, p. l1137-5, 1996Tradução . . Acesso em: 18 abr. 2024.

    • APA

      Gonzalez, E. R. (1996). Interpretation of the power response of a fuel cell with a quadratic logistic differential equation. Journal of the Electrochemical Society, 143( ju 1996), l1137-5.

    • NLM

      Gonzalez ER. Interpretation of the power response of a fuel cell with a quadratic logistic differential equation. Journal of the Electrochemical Society. 1996 ;143( ju 1996): l1137-5.[citado 2024 abr. 18 ]

    • Vancouver

      Gonzalez ER. Interpretation of the power response of a fuel cell with a quadratic logistic differential equation. Journal of the Electrochemical Society. 1996 ;143( ju 1996): l1137-5.[citado 2024 abr. 18 ]

  • Artigo de periodico

    'SI'-'SI''O IND.2' electronic interface roughness as a consequence of 'SI'-'SI''O IND.2' topographic interface roughness (1996)

    Lopes, M C V; Santos Filho, Sebastião Gomes dos ; Hasenack, Claus Martin; Baranauskas, V

    Source: Journal of the Electrochemical Society. Unidade: EP

    Assunto: CIRCUITOS INTEGRADOS

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    • ABNT

      LOPES, M C V et al. 'SI'-'SI''O IND.2' electronic interface roughness as a consequence of 'SI'-'SI''O IND.2' topographic interface roughness. Journal of the Electrochemical Society, v. 143, n. 3 , p. 1021-5, 1996Tradução . . Acesso em: 18 abr. 2024.

    • APA

      Lopes, M. C. V., Santos Filho, S. G. dos, Hasenack, C. M., & Baranauskas, V. (1996). 'SI'-'SI''O IND.2' electronic interface roughness as a consequence of 'SI'-'SI''O IND.2' topographic interface roughness. Journal of the Electrochemical Society, 143( 3 ), 1021-5.

    • NLM

      Lopes MCV, Santos Filho SG dos, Hasenack CM, Baranauskas V. 'SI'-'SI''O IND.2' electronic interface roughness as a consequence of 'SI'-'SI''O IND.2' topographic interface roughness. Journal of the Electrochemical Society. 1996 ;143( 3 ): 1021-5.[citado 2024 abr. 18 ]

    • Vancouver

      Lopes MCV, Santos Filho SG dos, Hasenack CM, Baranauskas V. 'SI'-'SI''O IND.2' electronic interface roughness as a consequence of 'SI'-'SI''O IND.2' topographic interface roughness. Journal of the Electrochemical Society. 1996 ;143( 3 ): 1021-5.[citado 2024 abr. 18 ]

  • Artigo de periodico

    A Less critical cleaning procedure for silicon wafers using diluted hf dip and boiling in isopropil alcohol as final steps (1995)

    Santos Filho, Sebastião Gomes dos ; Hasenack, Claus Martin; Salay, L C; Mertens, P W

    Source: Journal of the Electrochemical Society. Unidade: EP

    Assunto: CIRCUITOS INTEGRADOS

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      SANTOS FILHO, Sebastião Gomes dos et al. A Less critical cleaning procedure for silicon wafers using diluted hf dip and boiling in isopropil alcohol as final steps. Journal of the Electrochemical Society, v. 142, n. 3 , p. 902-7, 1995Tradução . . Disponível em: https://doi.org/10.1149/1.2048555. Acesso em: 18 abr. 2024.

    • APA

      Santos Filho, S. G. dos, Hasenack, C. M., Salay, L. C., & Mertens, P. W. (1995). A Less critical cleaning procedure for silicon wafers using diluted hf dip and boiling in isopropil alcohol as final steps. Journal of the Electrochemical Society, 142( 3 ), 902-7. doi:10.1149/1.2048555

    • NLM

      Santos Filho SG dos, Hasenack CM, Salay LC, Mertens PW. A Less critical cleaning procedure for silicon wafers using diluted hf dip and boiling in isopropil alcohol as final steps [Internet]. Journal of the Electrochemical Society. 1995 ;142( 3 ): 902-7.[citado 2024 abr. 18 ] Available from: https://doi.org/10.1149/1.2048555

    • Vancouver

      Santos Filho SG dos, Hasenack CM, Salay LC, Mertens PW. A Less critical cleaning procedure for silicon wafers using diluted hf dip and boiling in isopropil alcohol as final steps [Internet]. Journal of the Electrochemical Society. 1995 ;142( 3 ): 902-7.[citado 2024 abr. 18 ] Available from: https://doi.org/10.1149/1.2048555

  • Artigo de periodico

    Analysis of the etching mechanisms of tungsten in fluorine containing plasmas (1995)

    Verdonck, Patrick Bernard; Swart, Jacobus Willibrordus; Brasseur, G; De Geyter, P

    Source: Journal of the Electrochemical Society. Unidade: EP

    Assunto: CIRCUITOS INTEGRADOS

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    • ABNT

      VERDONCK, Patrick Bernard et al. Analysis of the etching mechanisms of tungsten in fluorine containing plasmas. Journal of the Electrochemical Society, v. 142, n. ju 1995, p. 1971-6, 1995Tradução . . Acesso em: 18 abr. 2024.

    • APA

      Verdonck, P. B., Swart, J. W., Brasseur, G., & De Geyter, P. (1995). Analysis of the etching mechanisms of tungsten in fluorine containing plasmas. Journal of the Electrochemical Society, 142( ju 1995), 1971-6.

    • NLM

      Verdonck PB, Swart JW, Brasseur G, De Geyter P. Analysis of the etching mechanisms of tungsten in fluorine containing plasmas. Journal of the Electrochemical Society. 1995 ;142( ju 1995): 1971-6.[citado 2024 abr. 18 ]

    • Vancouver

      Verdonck PB, Swart JW, Brasseur G, De Geyter P. Analysis of the etching mechanisms of tungsten in fluorine containing plasmas. Journal of the Electrochemical Society. 1995 ;142( ju 1995): 1971-6.[citado 2024 abr. 18 ]

  • Artigo de periodico

    Application of the flooded-agglomerate model to study oxygen reduction on thin porous coating rotating disk electrode (1994)

    Perez, Joelma ; Tanaka, Auro Atsushi; Gonzalez, E R; Ticianelli, Edson Antonio

    Source: Journal of the Electrochemical Society. Unidade: IQSC

    Assunto: ELETROQUÍMICA

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      PEREZ, Joelma et al. Application of the flooded-agglomerate model to study oxygen reduction on thin porous coating rotating disk electrode. Journal of the Electrochemical Society, v. 141, n. 2 , p. 431-6, 1994Tradução . . Acesso em: 18 abr. 2024.

    • APA

      Perez, J., Tanaka, A. A., Gonzalez, E. R., & Ticianelli, E. A. (1994). Application of the flooded-agglomerate model to study oxygen reduction on thin porous coating rotating disk electrode. Journal of the Electrochemical Society, 141( 2 ), 431-6.

    • NLM

      Perez J, Tanaka AA, Gonzalez ER, Ticianelli EA. Application of the flooded-agglomerate model to study oxygen reduction on thin porous coating rotating disk electrode. Journal of the Electrochemical Society. 1994 ;141( 2 ): 431-6.[citado 2024 abr. 18 ]

    • Vancouver

      Perez J, Tanaka AA, Gonzalez ER, Ticianelli EA. Application of the flooded-agglomerate model to study oxygen reduction on thin porous coating rotating disk electrode. Journal of the Electrochemical Society. 1994 ;141( 2 ): 431-6.[citado 2024 abr. 18 ]

  • Artigo de periodico

    Numerical calculations of the effects of structural imperfections on mos capacitors (1994)

    Lopes, M C V; Hasenack, Claus Martin; Baranauskas, V

    Source: Journal of the Electrochemical Society. Unidade: EP

    Assunto: SEMICONDUTORES

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    • ABNT

      LOPES, M C V e HASENACK, Claus Martin e BARANAUSKAS, V. Numerical calculations of the effects of structural imperfections on mos capacitors. Journal of the Electrochemical Society, v. 141, n. ju 1994, p. 1621-8, 1994Tradução . . Acesso em: 18 abr. 2024.

    • APA

      Lopes, M. C. V., Hasenack, C. M., & Baranauskas, V. (1994). Numerical calculations of the effects of structural imperfections on mos capacitors. Journal of the Electrochemical Society, 141( ju 1994), 1621-8.

    • NLM

      Lopes MCV, Hasenack CM, Baranauskas V. Numerical calculations of the effects of structural imperfections on mos capacitors. Journal of the Electrochemical Society. 1994 ;141( ju 1994): 1621-8.[citado 2024 abr. 18 ]

    • Vancouver

      Lopes MCV, Hasenack CM, Baranauskas V. Numerical calculations of the effects of structural imperfections on mos capacitors. Journal of the Electrochemical Society. 1994 ;141( ju 1994): 1621-8.[citado 2024 abr. 18 ]

  • Artigo de periodico

    Electrochemical studies witer copper-based alloys (1993)

    Hurtado, M R F; Sumodjo, P T A; Benedetti, A V

    Source: Journal of the Electrochemical Society. Unidade: IQ

    Subjects: FÍSICO-QUÍMICA, ELETROQUÍMICA

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    • ABNT

      HURTADO, M R F e SUMODJO, P T A e BENEDETTI, A V. Electrochemical studies witer copper-based alloys. Journal of the Electrochemical Society, v. 140, n. 6 , p. 1567-71, 1993Tradução . . Acesso em: 18 abr. 2024.

    • APA

      Hurtado, M. R. F., Sumodjo, P. T. A., & Benedetti, A. V. (1993). Electrochemical studies witer copper-based alloys. Journal of the Electrochemical Society, 140( 6 ), 1567-71.

    • NLM

      Hurtado MRF, Sumodjo PTA, Benedetti AV. Electrochemical studies witer copper-based alloys. Journal of the Electrochemical Society. 1993 ;140( 6 ): 1567-71.[citado 2024 abr. 18 ]

    • Vancouver

      Hurtado MRF, Sumodjo PTA, Benedetti AV. Electrochemical studies witer copper-based alloys. Journal of the Electrochemical Society. 1993 ;140( 6 ): 1567-71.[citado 2024 abr. 18 ]

  • Artigo de periodico

    In situ raman and reflectance spectra of iron electrodes in borate buffer solution containing 2,2'-bipyridine (1993)

    Rubim, J C

    Source: Journal of the Electrochemical Society. Unidade: IQ

    Assunto: QUÍMICA ANALÍTICA

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      RUBIM, J C. In situ raman and reflectance spectra of iron electrodes in borate buffer solution containing 2,2'-bipyridine. Journal of the Electrochemical Society, v. 140, n. 6 , p. 1601-6, 1993Tradução . . Acesso em: 18 abr. 2024.

    • APA

      Rubim, J. C. (1993). In situ raman and reflectance spectra of iron electrodes in borate buffer solution containing 2,2'-bipyridine. Journal of the Electrochemical Society, 140( 6 ), 1601-6.

    • NLM

      Rubim JC. In situ raman and reflectance spectra of iron electrodes in borate buffer solution containing 2,2'-bipyridine. Journal of the Electrochemical Society. 1993 ;140( 6 ): 1601-6.[citado 2024 abr. 18 ]

    • Vancouver

      Rubim JC. In situ raman and reflectance spectra of iron electrodes in borate buffer solution containing 2,2'-bipyridine. Journal of the Electrochemical Society. 1993 ;140( 6 ): 1601-6.[citado 2024 abr. 18 ]

  • Artigo de periodico

    Rotating ring-disk electrode studies of 'CU'-'ZN' alloy electrodissolution in 1m h'CL' (1993)

    Costa, S L F A; Agostinho, S M L; Nobe, K

    Source: Journal of the Electrochemical Society. Unidade: IQ

    Subjects: FÍSICO-QUÍMICA, ELETROQUÍMICA

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    • ABNT

      COSTA, S L F A e AGOSTINHO, S M L e NOBE, K. Rotating ring-disk electrode studies of 'CU'-'ZN' alloy electrodissolution in 1m h'CL'. Journal of the Electrochemical Society, v. 140, n. 12, p. 3483-8, 1993Tradução . . Acesso em: 18 abr. 2024.

    • APA

      Costa, S. L. F. A., Agostinho, S. M. L., & Nobe, K. (1993). Rotating ring-disk electrode studies of 'CU'-'ZN' alloy electrodissolution in 1m h'CL'. Journal of the Electrochemical Society, 140( 12), 3483-8.

    • NLM

      Costa SLFA, Agostinho SML, Nobe K. Rotating ring-disk electrode studies of 'CU'-'ZN' alloy electrodissolution in 1m h'CL'. Journal of the Electrochemical Society. 1993 ;140( 12): 3483-8.[citado 2024 abr. 18 ]

    • Vancouver

      Costa SLFA, Agostinho SML, Nobe K. Rotating ring-disk electrode studies of 'CU'-'ZN' alloy electrodissolution in 1m h'CL'. Journal of the Electrochemical Society. 1993 ;140( 12): 3483-8.[citado 2024 abr. 18 ]

  • Artigo de periodico

    Effect of a graphite holder on diamond synthesis by microwave plasma chemical vapor deposition (1992)

    Salvadori, M C; Brewer, M A; Ager, J W; Krishnan, K M; Brown, I G

    Source: Journal of the Electrochemical Society. Unidade: IF

    Assunto: FÍSICO-QUÍMICA

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      SALVADORI, M C et al. Effect of a graphite holder on diamond synthesis by microwave plasma chemical vapor deposition. Journal of the Electrochemical Society, v. fe 1992, n. 2 , p. 558-60, 1992Tradução . . Acesso em: 18 abr. 2024.

    • APA

      Salvadori, M. C., Brewer, M. A., Ager, J. W., Krishnan, K. M., & Brown, I. G. (1992). Effect of a graphite holder on diamond synthesis by microwave plasma chemical vapor deposition. Journal of the Electrochemical Society, fe 1992( 2 ), 558-60.

    • NLM

      Salvadori MC, Brewer MA, Ager JW, Krishnan KM, Brown IG. Effect of a graphite holder on diamond synthesis by microwave plasma chemical vapor deposition. Journal of the Electrochemical Society. 1992 ; fe 1992( 2 ): 558-60.[citado 2024 abr. 18 ]

    • Vancouver

      Salvadori MC, Brewer MA, Ager JW, Krishnan KM, Brown IG. Effect of a graphite holder on diamond synthesis by microwave plasma chemical vapor deposition. Journal of the Electrochemical Society. 1992 ; fe 1992( 2 ): 558-60.[citado 2024 abr. 18 ]

  • Artigo de periodico

    Study of the thermal stability of the al / tiw / tisi2 / si structure (1991)

    Furlan, Rogério ; Van der Spiegel, J; Swart, Jacobus Willibrordus

    Source: Journal of the Electrochemical Society. Unidade: EP

    Assunto: SEMICONDUTORES

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      FURLAN, Rogério e VAN DER SPIEGEL, J e SWART, Jacobus Willibrordus. Study of the thermal stability of the al / tiw / tisi2 / si structure. Journal of the Electrochemical Society, v. 138, n. 8 , p. 2377-81, 1991Tradução . . Acesso em: 18 abr. 2024.

    • APA

      Furlan, R., Van der Spiegel, J., & Swart, J. W. (1991). Study of the thermal stability of the al / tiw / tisi2 / si structure. Journal of the Electrochemical Society, 138( 8 ), 2377-81.

    • NLM

      Furlan R, Van der Spiegel J, Swart JW. Study of the thermal stability of the al / tiw / tisi2 / si structure. Journal of the Electrochemical Society. 1991 ;138( 8 ): 2377-81.[citado 2024 abr. 18 ]

    • Vancouver

      Furlan R, Van der Spiegel J, Swart JW. Study of the thermal stability of the al / tiw / tisi2 / si structure. Journal of the Electrochemical Society. 1991 ;138( 8 ): 2377-81.[citado 2024 abr. 18 ]

  • Trabalho de evento-resumo periodico

    Study of thick anodic oxide films on pt by spectroscopic ellipsometry (1991)

    Ticianelli, Edson Antonio ; Tremiliosi Filho, Germano ; Maia, G; Floriano, J B

    Source: Journal of the Electrochemical Society. Conference titles: Spring Meeting of the Electrochemical Society. Unidade: IQSC

    Assunto: ELETROQUÍMICA

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      TICIANELLI, Edson Antonio et al. Study of thick anodic oxide films on pt by spectroscopic ellipsometry. Journal of the Electrochemical Society. Pennington: Instituto de Química de São Carlos, Universidade de São Paulo. . Acesso em: 18 abr. 2024. , 1991

    • APA

      Ticianelli, E. A., Tremiliosi Filho, G., Maia, G., & Floriano, J. B. (1991). Study of thick anodic oxide films on pt by spectroscopic ellipsometry. Journal of the Electrochemical Society. Pennington: Instituto de Química de São Carlos, Universidade de São Paulo.

    • NLM

      Ticianelli EA, Tremiliosi Filho G, Maia G, Floriano JB. Study of thick anodic oxide films on pt by spectroscopic ellipsometry. Journal of the Electrochemical Society. 1991 ;138( 3 ): 114c.[citado 2024 abr. 18 ]

    • Vancouver

      Ticianelli EA, Tremiliosi Filho G, Maia G, Floriano JB. Study of thick anodic oxide films on pt by spectroscopic ellipsometry. Journal of the Electrochemical Society. 1991 ;138( 3 ): 114c.[citado 2024 abr. 18 ]

  • Artigo de periodico

    Influence of impurities on cobalt silicide formation (1991)

    Freitas, W; Swart, Jacobus Willibrordus

    Source: Journal of the Electrochemical Society. Unidade: EP

    Assunto: SEMICONDUTORES

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      FREITAS, W e SWART, Jacobus Willibrordus. Influence of impurities on cobalt silicide formation. Journal of the Electrochemical Society, v. 138, n. 10, p. 3067-70, 1991Tradução . . Acesso em: 18 abr. 2024.

    • APA

      Freitas, W., & Swart, J. W. (1991). Influence of impurities on cobalt silicide formation. Journal of the Electrochemical Society, 138( 10), 3067-70.

    • NLM

      Freitas W, Swart JW. Influence of impurities on cobalt silicide formation. Journal of the Electrochemical Society. 1991 ;138( 10): 3067-70.[citado 2024 abr. 18 ]

    • Vancouver

      Freitas W, Swart JW. Influence of impurities on cobalt silicide formation. Journal of the Electrochemical Society. 1991 ;138( 10): 3067-70.[citado 2024 abr. 18 ]

  • Trabalho de evento-resumo periodico

    Investigation of the growth and the cycling of films of polianiline and polypyrrole with combined spectroscopic ellipsometry and microbalance techniques (1991)

    Sabatani, E; Ticianelli, Edson Antonio ; Rubinstein, I; Redondo, A; Rishpon, J; Gottesfeld, S

    Source: Journal of the Electrochemical Society. Conference titles: Spring Meeting of the Electrochemical Society. Unidade: IQSC

    Assunto: ELETROQUÍMICA

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      SABATANI, E et al. Investigation of the growth and the cycling of films of polianiline and polypyrrole with combined spectroscopic ellipsometry and microbalance techniques. Journal of the Electrochemical Society. Pennington: Instituto de Química de São Carlos, Universidade de São Paulo. . Acesso em: 18 abr. 2024. , 1991

    • APA

      Sabatani, E., Ticianelli, E. A., Rubinstein, I., Redondo, A., Rishpon, J., & Gottesfeld, S. (1991). Investigation of the growth and the cycling of films of polianiline and polypyrrole with combined spectroscopic ellipsometry and microbalance techniques. Journal of the Electrochemical Society. Pennington: Instituto de Química de São Carlos, Universidade de São Paulo.

    • NLM

      Sabatani E, Ticianelli EA, Rubinstein I, Redondo A, Rishpon J, Gottesfeld S. Investigation of the growth and the cycling of films of polianiline and polypyrrole with combined spectroscopic ellipsometry and microbalance techniques. Journal of the Electrochemical Society. 1991 ;138( 3 ): 171c.[citado 2024 abr. 18 ]

    • Vancouver

      Sabatani E, Ticianelli EA, Rubinstein I, Redondo A, Rishpon J, Gottesfeld S. Investigation of the growth and the cycling of films of polianiline and polypyrrole with combined spectroscopic ellipsometry and microbalance techniques. Journal of the Electrochemical Society. 1991 ;138( 3 ): 171c.[citado 2024 abr. 18 ]

  • Artigo de periodico

    Rapid thermal flow of PSG films in vacuum using a graphite heater (1990)

    Santos Filho, Sebastião Gomes dos ; Swart, Jacobus Willibrordus

    Source: Journal of the Electrochemical Society. Unidade: EP

    Assunto: CIRCUITOS INTEGRADOS

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      SANTOS FILHO, Sebastião Gomes dos e SWART, Jacobus Willibrordus. Rapid thermal flow of PSG films in vacuum using a graphite heater. Journal of the Electrochemical Society, v. 137, n. 4 , p. 1252-5, 1990Tradução . . Disponível em: https://doi.org/10.1149/1.2086642. Acesso em: 18 abr. 2024.

    • APA

      Santos Filho, S. G. dos, & Swart, J. W. (1990). Rapid thermal flow of PSG films in vacuum using a graphite heater. Journal of the Electrochemical Society, 137( 4 ), 1252-5. doi:10.1149/1.2086642

    • NLM

      Santos Filho SG dos, Swart JW. Rapid thermal flow of PSG films in vacuum using a graphite heater [Internet]. Journal of the Electrochemical Society. 1990 ;137( 4 ): 1252-5.[citado 2024 abr. 18 ] Available from: https://doi.org/10.1149/1.2086642

    • Vancouver

      Santos Filho SG dos, Swart JW. Rapid thermal flow of PSG films in vacuum using a graphite heater [Internet]. Journal of the Electrochemical Society. 1990 ;137( 4 ): 1252-5.[citado 2024 abr. 18 ] Available from: https://doi.org/10.1149/1.2086642

  • Artigo de periodico

    Titanium silicide formation and arsenic dopant behavior under rapid thermal treatments in vacuum (1989)

    Furlan, Rogério ; Swart, Jacobus Willibrordus

    Source: Journal of the Electrochemical Society. Unidade: EP

    Subjects: TRATAMENTO TÉRMICO, TECNOLOGIA DO VÁCUO

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      FURLAN, Rogério e SWART, Jacobus Willibrordus. Titanium silicide formation and arsenic dopant behavior under rapid thermal treatments in vacuum. Journal of the Electrochemical Society, v. 136, n. ju 1989, p. 1806-11, 1989Tradução . . Acesso em: 18 abr. 2024.

    • APA

      Furlan, R., & Swart, J. W. (1989). Titanium silicide formation and arsenic dopant behavior under rapid thermal treatments in vacuum. Journal of the Electrochemical Society, 136( ju 1989), 1806-11.

    • NLM

      Furlan R, Swart JW. Titanium silicide formation and arsenic dopant behavior under rapid thermal treatments in vacuum. Journal of the Electrochemical Society. 1989 ;136( ju 1989): 1806-11.[citado 2024 abr. 18 ]

    • Vancouver

      Furlan R, Swart JW. Titanium silicide formation and arsenic dopant behavior under rapid thermal treatments in vacuum. Journal of the Electrochemical Society. 1989 ;136( ju 1989): 1806-11.[citado 2024 abr. 18 ]

  • Artigo de periodico

    Methods to advance technology of proton exchange membrane fuel cells (1988)

    Ticianelli, Edson Antonio ; Derouin, C R; Redondo, A; Srinivasan, S

    Source: Journal of the Electrochemical Society. Unidade: IQSC

    Assunto: QUÍMICA

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      TICIANELLI, Edson Antonio et al. Methods to advance technology of proton exchange membrane fuel cells. Journal of the Electrochemical Society, v. 135, n. 9 , p. 2209-14, 1988Tradução . . Acesso em: 18 abr. 2024.

    • APA

      Ticianelli, E. A., Derouin, C. R., Redondo, A., & Srinivasan, S. (1988). Methods to advance technology of proton exchange membrane fuel cells. Journal of the Electrochemical Society, 135( 9 ), 2209-14.

    • NLM

      Ticianelli EA, Derouin CR, Redondo A, Srinivasan S. Methods to advance technology of proton exchange membrane fuel cells. Journal of the Electrochemical Society. 1988 ; 135( 9 ): 2209-14.[citado 2024 abr. 18 ]

    • Vancouver

      Ticianelli EA, Derouin CR, Redondo A, Srinivasan S. Methods to advance technology of proton exchange membrane fuel cells. Journal of the Electrochemical Society. 1988 ; 135( 9 ): 2209-14.[citado 2024 abr. 18 ]

  • Artigo de periodico

    Effects of phosphoric acid concentration on oxygen reduction kinetics at platinum (1984)

    Hsueh, K L; Gonzalez, Ernesto Rafael; Srinivasan, S; Chin, D T

    Source: Journal of the Electrochemical Society. Unidade: IQSC

    Assunto: ELETROQUÍMICA

    How to cite
    A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas

    • ABNT

      HSUEH, K L et al. Effects of phosphoric acid concentration on oxygen reduction kinetics at platinum. Journal of the Electrochemical Society, v. 131, n. 4, p. 823-828, 1984Tradução . . Acesso em: 18 abr. 2024.

    • APA

      Hsueh, K. L., Gonzalez, E. R., Srinivasan, S., & Chin, D. T. (1984). Effects of phosphoric acid concentration on oxygen reduction kinetics at platinum. Journal of the Electrochemical Society, 131( 4), 823-828.

    • NLM

      Hsueh KL, Gonzalez ER, Srinivasan S, Chin DT. Effects of phosphoric acid concentration on oxygen reduction kinetics at platinum. Journal of the Electrochemical Society. 1984 ; 131( 4): 823-828.[citado 2024 abr. 18 ]

    • Vancouver

      Hsueh KL, Gonzalez ER, Srinivasan S, Chin DT. Effects of phosphoric acid concentration on oxygen reduction kinetics at platinum. Journal of the Electrochemical Society. 1984 ; 131( 4): 823-828.[citado 2024 abr. 18 ]

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