Menu

Filtros : "Mansano, Ronaldo Domingues" "HOLOGRAMAS" Removido: "Contributions to plasma physics" Limpar

Filtros

Refine with date range

  • 1

1 - 2 (2 records)

  • Artigo de periodico

    Diffraction gratings fabricated in DLC thin films (2010)

    Cirino, Giuseppe Antonio; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Jasinevicius, Renato Goulart; Gonçalves Neto, Luiz

    Source: Surface and Coatings Technology. Unidades: EP, EESC

    Subjects: HOLOGRAMAS, ANÁLISE DE FOURIER, ÓPTICA

    Acesso à fonteAcesso à fonteDOIHow to cite
    A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas

    • ABNT

      CIRINO, Giuseppe Antonio et al. Diffraction gratings fabricated in DLC thin films. Surface and Coatings Technology, v. 204, n. 18-19, p. 2966-2970, 2010Tradução . . Disponível em: https://doi.org/10.1016/j.surfcoat.2010.02.037. Acesso em: 05 nov. 2024.

    • APA

      Cirino, G. A., Mansano, R. D., Verdonck, P. B., Jasinevicius, R. G., & Gonçalves Neto, L. (2010). Diffraction gratings fabricated in DLC thin films. Surface and Coatings Technology, 204( 18-19), 2966-2970. doi:10.1016/j.surfcoat.2010.02.037

    • NLM

      Cirino GA, Mansano RD, Verdonck PB, Jasinevicius RG, Gonçalves Neto L. Diffraction gratings fabricated in DLC thin films [Internet]. Surface and Coatings Technology. 2010 ; 204( 18-19): 2966-2970.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/j.surfcoat.2010.02.037

    • Vancouver

      Cirino GA, Mansano RD, Verdonck PB, Jasinevicius RG, Gonçalves Neto L. Diffraction gratings fabricated in DLC thin films [Internet]. Surface and Coatings Technology. 2010 ; 204( 18-19): 2966-2970.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/j.surfcoat.2010.02.037

  • Artigo de periodico

    Diffractive phase-shift lithography photomask operating in proximity printing mode (2010)

    Cirino, Giuseppe Antonio; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Cescato, Lucila; Gonçalves Neto, Luiz

    Source: Optics Express. Unidades: EP, EESC

    Subjects: HOLOGRAMAS, ÓPTICA

    Acesso à fonteDOIHow to cite
    A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas

    • ABNT

      CIRINO, Giuseppe Antonio et al. Diffractive phase-shift lithography photomask operating in proximity printing mode. Optics Express, v. 18, n. 16, p. 16387-16405, 2010Tradução . . Disponível em: https://doi.org/10.1364/OE.18.016387. Acesso em: 05 nov. 2024.

    • APA

      Cirino, G. A., Mansano, R. D., Verdonck, P. B., Cescato, L., & Gonçalves Neto, L. (2010). Diffractive phase-shift lithography photomask operating in proximity printing mode. Optics Express, 18( 16), 16387-16405. doi:10.1364/OE.18.016387

    • NLM

      Cirino GA, Mansano RD, Verdonck PB, Cescato L, Gonçalves Neto L. Diffractive phase-shift lithography photomask operating in proximity printing mode [Internet]. Optics Express. 2010 ; 18( 16): 16387-16405.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1364/OE.18.016387

    • Vancouver

      Cirino GA, Mansano RD, Verdonck PB, Cescato L, Gonçalves Neto L. Diffractive phase-shift lithography photomask operating in proximity printing mode [Internet]. Optics Express. 2010 ; 18( 16): 16387-16405.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1364/OE.18.016387
  • 1

1 - 2 (2 records)

Digital Library of Intellectual Production of Universidade de São Paulo     2012 - 2024