Diffractive phase-shift lithography photomask operating in proximity printing mode (2010)
Cirino, Giuseppe Antonio; Mansano, Ronaldo Domingues 
; Verdonck, Patrick Bernard; Cescato, Lucila; Gonçalves Neto, Luiz
Source: Optics Express. Unidades: EP, EESC
Subjects: HOLOGRAMAS, ÓPTICA
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CIRINO, Giuseppe Antonio et al. Diffractive phase-shift lithography photomask operating in proximity printing mode. Optics Express, v. 18, n. 16, p. 16387-16405, 2010Tradução . . Disponível em: https://doi.org/10.1364/OE.18.016387. Acesso em: 05 nov. 2024.APA
Cirino, G. A., Mansano, R. D., Verdonck, P. B., Cescato, L., & Gonçalves Neto, L. (2010). Diffractive phase-shift lithography photomask operating in proximity printing mode. Optics Express, 18( 16), 16387-16405. doi:10.1364/OE.18.016387NLM
Cirino GA, Mansano RD, Verdonck PB, Cescato L, Gonçalves Neto L. Diffractive phase-shift lithography photomask operating in proximity printing mode [Internet]. Optics Express. 2010 ; 18( 16): 16387-16405.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1364/OE.18.016387Vancouver
Cirino GA, Mansano RD, Verdonck PB, Cescato L, Gonçalves Neto L. Diffractive phase-shift lithography photomask operating in proximity printing mode [Internet]. Optics Express. 2010 ; 18( 16): 16387-16405.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1364/OE.18.016387
