Khan, Niqab; Stelo, Francielle; Santos, Gustavo Henrique Correia dos 
; Rossi, Liane Marcia ; Gonçalves, Renato Vitalino ; Wender, Heberton
Source: Applied Surface Science Advances. Unidades: IQ, IFSC
Subjects: PROPRIEDADES DOS MATERIAIS, FOTOCATÁLISE, SEMICONDUTORES, ELETROQUÍMICA
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KHAN, Niqab et al. Recent advances on Z-scheme engineered BiVO4-based semiconductor photocatalysts for CO2 reduction: a review. Applied Surface Science Advances, v. 11, p. 100289-1-100289-16, 2022Tradução . . Disponível em: https://doi.org/10.1016/j.apsadv.2022.100289. Acesso em: 22 ago. 2024.APA
Khan, N., Stelo, F., Santos, G. H. C. dos, Rossi, L. M., Gonçalves, R. V., & Wender, H. (2022). Recent advances on Z-scheme engineered BiVO4-based semiconductor photocatalysts for CO2 reduction: a review. Applied Surface Science Advances, 11, 100289-1-100289-16. doi:10.1016/j.apsadv.2022.100289NLM
Khan N, Stelo F, Santos GHC dos, Rossi LM, Gonçalves RV, Wender H. Recent advances on Z-scheme engineered BiVO4-based semiconductor photocatalysts for CO2 reduction: a review [Internet]. Applied Surface Science Advances. 2022 ; 11 100289-1-100289-16.[citado 2024 ago. 22 ] Available from: https://doi.org/10.1016/j.apsadv.2022.100289Vancouver
Khan N, Stelo F, Santos GHC dos, Rossi LM, Gonçalves RV, Wender H. Recent advances on Z-scheme engineered BiVO4-based semiconductor photocatalysts for CO2 reduction: a review [Internet]. Applied Surface Science Advances. 2022 ; 11 100289-1-100289-16.[citado 2024 ago. 22 ] Available from: https://doi.org/10.1016/j.apsadv.2022.100289
