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Filtros : "Universidade Federal do Rio Grande do Sul (UFRGS)" "Financiamento CAPES-PrInt" Removidos: "Trevizan, Maria Auxiliadora" "MAE" "Direito Processual" "Hirata, Mario Hiroyuki" "Plasmonics: principles and applications" "GEOCRONOLOGIA" "ICB-BMB" "IME-MAC" "AMBROSIO, CARLOS EDUARDO" "RIBEIRO, MARCELO LEITE" "Desenvolvimento e mudanças globais" "Universidade de São Paulo - USP, Instituto de Física de São Carlos - IFSC" "Congresso Brasileiro de Toxicologia (CBTOX)" Limpar

Filtros

Artigo de periodico
Recent advances on Z-scheme engineered BiVO4-based semiconductor photocatalysts for CO2 reduction: a review (2022)
Khan, Niqab; Stelo, Francielle; Santos, Gustavo Henrique Correia dos ; Rossi, Liane Marcia ; Gonçalves, Renato Vitalino ; Wender, Heberton
Source: Applied Surface Science Advances. Unidades: IQ, IFSC
Subjects: PROPRIEDADES DOS MATERIAIS, FOTOCATÁLISE, SEMICONDUTORES, ELETROQUÍMICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
KHAN, Niqab et al. Recent advances on Z-scheme engineered BiVO4-based semiconductor photocatalysts for CO2 reduction: a review. Applied Surface Science Advances, v. 11, p. 100289-1-100289-16, 2022Tradução . . Disponível em: https://doi.org/10.1016/j.apsadv.2022.100289. Acesso em: 13 jul. 2024.
APA
Khan, N., Stelo, F., Santos, G. H. C. dos, Rossi, L. M., Gonçalves, R. V., & Wender, H. (2022). Recent advances on Z-scheme engineered BiVO4-based semiconductor photocatalysts for CO2 reduction: a review. Applied Surface Science Advances, 11, 100289-1-100289-16. doi:10.1016/j.apsadv.2022.100289
NLM
Khan N, Stelo F, Santos GHC dos, Rossi LM, Gonçalves RV, Wender H. Recent advances on Z-scheme engineered BiVO4-based semiconductor photocatalysts for CO2 reduction: a review [Internet]. Applied Surface Science Advances. 2022 ; 11 100289-1-100289-16.[citado 2024 jul. 13 ] Available from: https://doi.org/10.1016/j.apsadv.2022.100289
Vancouver
Khan N, Stelo F, Santos GHC dos, Rossi LM, Gonçalves RV, Wender H. Recent advances on Z-scheme engineered BiVO4-based semiconductor photocatalysts for CO2 reduction: a review [Internet]. Applied Surface Science Advances. 2022 ; 11 100289-1-100289-16.[citado 2024 jul. 13 ] Available from: https://doi.org/10.1016/j.apsadv.2022.100289
Artigo de periodico
Ionic liquid based dopant-free band edge shift in BiVO4 particles for photocatalysis under simulated sunlight irradiation (2022)
Khan, Niqab; Wolff, Rogério Nunes ; Ullah, Hameed; Chacón, Gustavo J. ; Santa Rosa, Washington ; Dupont, Jairton ; Gonçalves, Renato Vitalino ; Khan, Sherdil
Source: Materials Advances. Unidade: IFSC
Subjects: FOTOCATÁLISE, ELETROQUÍMICA, SEMICONDUTORES
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
KHAN, Niqab et al. Ionic liquid based dopant-free band edge shift in BiVO4 particles for photocatalysis under simulated sunlight irradiation. Materials Advances, v. 3, n. 16, p. 6485-6495 + supplementary information, 2022Tradução . . Disponível em: https://doi.org/10.1039/d2ma00259k. Acesso em: 13 jul. 2024.
APA
Khan, N., Wolff, R. N., Ullah, H., Chacón, G. J., Santa Rosa, W., Dupont, J., et al. (2022). Ionic liquid based dopant-free band edge shift in BiVO4 particles for photocatalysis under simulated sunlight irradiation. Materials Advances, 3( 16), 6485-6495 + supplementary information. doi:10.1039/d2ma00259k.
NLM
Khan N, Wolff RN, Ullah H, Chacón GJ, Santa Rosa W, Dupont J, Gonçalves RV, Khan S. Ionic liquid based dopant-free band edge shift in BiVO4 particles for photocatalysis under simulated sunlight irradiation [Internet]. Materials Advances. 2022 ; 3( 16): 6485-6495 + supplementary information.[citado 2024 jul. 13 ] Available from: https://doi.org/10.1039/d2ma00259k.
Vancouver
Khan N, Wolff RN, Ullah H, Chacón GJ, Santa Rosa W, Dupont J, Gonçalves RV, Khan S. Ionic liquid based dopant-free band edge shift in BiVO4 particles for photocatalysis under simulated sunlight irradiation [Internet]. Materials Advances. 2022 ; 3( 16): 6485-6495 + supplementary information.[citado 2024 jul. 13 ] Available from: https://doi.org/10.1039/d2ma00259k.

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