Retention of copper(II) metal ions in a silicon-glass microfluidic device (2007)
Silva, José Alberto Fracassi da; Lago, Claudimir Lucio do 
; Furlan, Rogério
Source: Journal of the Brazilian Chemical Society. Unidade: IQ
Subjects: AMPEROMETRIA, SILÍCIO, COBRE, ÍONS
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ABNT
SILVA, José Alberto Fracassi da e LAGO, Claudimir Lucio do e FURLAN, Rogério. Retention of copper(II) metal ions in a silicon-glass microfluidic device. Journal of the Brazilian Chemical Society, v. 18, n. 8, p. 1531-1536, 2007Tradução . . Disponível em: https://doi.org/10.1590/s0103-50532007000800013. Acesso em: 17 nov. 2024.APA
Silva, J. A. F. da, Lago, C. L. do, & Furlan, R. (2007). Retention of copper(II) metal ions in a silicon-glass microfluidic device. Journal of the Brazilian Chemical Society, 18( 8), 1531-1536. doi:10.1590/s0103-50532007000800013NLM
Silva JAF da, Lago CL do, Furlan R. Retention of copper(II) metal ions in a silicon-glass microfluidic device [Internet]. Journal of the Brazilian Chemical Society. 2007 ; 18( 8): 1531-1536.[citado 2024 nov. 17 ] Available from: https://doi.org/10.1590/s0103-50532007000800013Vancouver
Silva JAF da, Lago CL do, Furlan R. Retention of copper(II) metal ions in a silicon-glass microfluidic device [Internet]. Journal of the Brazilian Chemical Society. 2007 ; 18( 8): 1531-1536.[citado 2024 nov. 17 ] Available from: https://doi.org/10.1590/s0103-50532007000800013
