Source: Applied Surface Science. Unidade: IFSC
Subjects: MATERIAIS CERÂMICOS, LASER, FILMES FINOS, PROPRIEDADES DOS MATERIAIS
ABNT
PAULA, Kelly Tasso de et al. Femtosecond laser induced damage threshold incubation and oxidation in AS2S3 and AS2Se3 thin fillms. Applied Surface Science, v. 654, p. 159449-1-159449-10, 2024Tradução . . Disponível em: https://doi.org/10.1016/j.apsusc.2024.159449. Acesso em: 18 ago. 2024.APA
Paula, K. T. de, Dutta, N. S., Almeida, J. M. P. de, Nolasco, L. K., Andrade, M. B. de, Arnold, C. B., & Mendonça, C. R. (2024). Femtosecond laser induced damage threshold incubation and oxidation in AS2S3 and AS2Se3 thin fillms. Applied Surface Science, 654, 159449-1-159449-10. doi:10.1016/j.apsusc.2024.159449NLM
Paula KT de, Dutta NS, Almeida JMP de, Nolasco LK, Andrade MB de, Arnold CB, Mendonça CR. Femtosecond laser induced damage threshold incubation and oxidation in AS2S3 and AS2Se3 thin fillms [Internet]. Applied Surface Science. 2024 ; 654 159449-1-159449-10.[citado 2024 ago. 18 ] Available from: https://doi.org/10.1016/j.apsusc.2024.159449Vancouver
Paula KT de, Dutta NS, Almeida JMP de, Nolasco LK, Andrade MB de, Arnold CB, Mendonça CR. Femtosecond laser induced damage threshold incubation and oxidation in AS2S3 and AS2Se3 thin fillms [Internet]. Applied Surface Science. 2024 ; 654 159449-1-159449-10.[citado 2024 ago. 18 ] Available from: https://doi.org/10.1016/j.apsusc.2024.159449