Mechanisms of surface roughness induced in silicon by fluorine containing plasmas (1996)
Mansano, Ronaldo Domingues 
; Verdonck, Patrick Bernard; Maciel, H. S.
Source: Abstracts Book. Conference titles: International Conference on Thin Films. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
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ABNT
MANSANO, Ronaldo Domingues e VERDONCK, Patrick Bernard e MACIEL, H. S. Mechanisms of surface roughness induced in silicon by fluorine containing plasmas. 1996, Anais.. Madrid: Escola Politécnica, Universidade de São Paulo, 1996. . Acesso em: 05 nov. 2024.APA
Mansano, R. D., Verdonck, P. B., & Maciel, H. S. (1996). Mechanisms of surface roughness induced in silicon by fluorine containing plasmas. In Abstracts Book. Madrid: Escola Politécnica, Universidade de São Paulo.NLM
Mansano RD, Verdonck PB, Maciel HS. Mechanisms of surface roughness induced in silicon by fluorine containing plasmas. Abstracts Book. 1996 ;[citado 2024 nov. 05 ]Vancouver
Mansano RD, Verdonck PB, Maciel HS. Mechanisms of surface roughness induced in silicon by fluorine containing plasmas. Abstracts Book. 1996 ;[citado 2024 nov. 05 ]
