Source: Journal of Applied Crystallography. Unidade: IF
Assunto: FILMES FINOS
ABNT
COSTA, Daniel da Silva e KELLERMANN, Guinther e CRAIEVICH, Aldo Felix. Two-step GISAXS characterization of NiSi2 nanoplates and Ni nanocrystals embedded in a silicon wafer covered with a silica thin film. Journal of Applied Crystallography, v. 56, p. 95-102, 2023Tradução . . Disponível em: https://doi.org/10.1107/S1600576722010974. Acesso em: 23 abr. 2024.APA
Costa, D. da S., Kellermann, G., & Craievich, A. F. (2023). Two-step GISAXS characterization of NiSi2 nanoplates and Ni nanocrystals embedded in a silicon wafer covered with a silica thin film. Journal of Applied Crystallography, 56, 95-102. doi:10.1107/S1600576722010974NLM
Costa D da S, Kellermann G, Craievich AF. Two-step GISAXS characterization of NiSi2 nanoplates and Ni nanocrystals embedded in a silicon wafer covered with a silica thin film [Internet]. Journal of Applied Crystallography. 2023 ; 56 95-102.[citado 2024 abr. 23 ] Available from: https://doi.org/10.1107/S1600576722010974Vancouver
Costa D da S, Kellermann G, Craievich AF. Two-step GISAXS characterization of NiSi2 nanoplates and Ni nanocrystals embedded in a silicon wafer covered with a silica thin film [Internet]. Journal of Applied Crystallography. 2023 ; 56 95-102.[citado 2024 abr. 23 ] Available from: https://doi.org/10.1107/S1600576722010974