Plasma-assisted chemical vapour deposition in a tunable microwave cavity (1995)
Salvadori, Maria Cecília Barbosa da Silveira 
; Mammana, V P; Martins, O G; Degasperi, F T
Source: Plasma Sources Science Technology. Unidade: IF
Assunto: FÍSICO-QUÍMICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
SALVADORI, Maria Cecília Barbosa da Silveira et al. Plasma-assisted chemical vapour deposition in a tunable microwave cavity. Plasma Sources Science Technology, v. 4 , p. 489-94, 1995Tradução . . Disponível em: https://doi.org/10.1088/0963-0252/4/3/019. Acesso em: 14 fev. 2026.APA
Salvadori, M. C. B. da S., Mammana, V. P., Martins, O. G., & Degasperi, F. T. (1995). Plasma-assisted chemical vapour deposition in a tunable microwave cavity. Plasma Sources Science Technology, 4 , 489-94. doi:10.1088/0963-0252/4/3/019NLM
Salvadori MCB da S, Mammana VP, Martins OG, Degasperi FT. Plasma-assisted chemical vapour deposition in a tunable microwave cavity [Internet]. Plasma Sources Science Technology. 1995 ;4 489-94.[citado 2026 fev. 14 ] Available from: https://doi.org/10.1088/0963-0252/4/3/019Vancouver
Salvadori MCB da S, Mammana VP, Martins OG, Degasperi FT. Plasma-assisted chemical vapour deposition in a tunable microwave cavity [Internet]. Plasma Sources Science Technology. 1995 ;4 489-94.[citado 2026 fev. 14 ] Available from: https://doi.org/10.1088/0963-0252/4/3/019
