Source: ORAL SESSION G4. Conference titles: Encontro da Sociedade Brasileira de Pesquisas em Materiais (SBPMat. Unidade: IF
Subjects: MATERIAIS (PESQUISA), FILMES FINOS, SEMICONDUTORES
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
MORELHÃO, Sérgio Luiz. A few contributions in synchrotron x-ray analysis of nanostructured semiconductor devices and amorphous thin films: charactrization during dip coating. 2006, Anais.. Rio de Janeiro: SBPMat, 2006. Disponível em: http://www.sbpmat.org.br/5encontro/SympG.pdf. Acesso em: 07 out. 2024.APA
Morelhão, S. L. (2006). A few contributions in synchrotron x-ray analysis of nanostructured semiconductor devices and amorphous thin films: charactrization during dip coating. In ORAL SESSION G4. Rio de Janeiro: SBPMat. Recuperado de http://www.sbpmat.org.br/5encontro/SympG.pdfNLM
Morelhão SL. A few contributions in synchrotron x-ray analysis of nanostructured semiconductor devices and amorphous thin films: charactrization during dip coating [Internet]. ORAL SESSION G4. 2006 ;[citado 2024 out. 07 ] Available from: http://www.sbpmat.org.br/5encontro/SympG.pdfVancouver
Morelhão SL. A few contributions in synchrotron x-ray analysis of nanostructured semiconductor devices and amorphous thin films: charactrization during dip coating [Internet]. ORAL SESSION G4. 2006 ;[citado 2024 out. 07 ] Available from: http://www.sbpmat.org.br/5encontro/SympG.pdf
