Electronic structure and gate capacitance voltage characteristics of MBE silicon 'delta'-FETs (1997)
Source: Materials modification and synthesis by ion beam processing. Unidade: IFSC
Subjects: MATÉRIA CONDENSADA, MATÉRIA CONDENSADA (PROPRIEDADES ELÉTRICAS)
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MANZOLI, José Eduardo e HIPÓLITO, Oscar. Electronic structure and gate capacitance voltage characteristics of MBE silicon 'delta'-FETs. Materials modification and synthesis by ion beam processing. Tradução . Pittsburgh: Materials Research Society, 1997. . . Acesso em: 10 fev. 2026.APA
Manzoli, J. E., & Hipólito, O. (1997). Electronic structure and gate capacitance voltage characteristics of MBE silicon 'delta'-FETs. In Materials modification and synthesis by ion beam processing. Pittsburgh: Materials Research Society.NLM
Manzoli JE, Hipólito O. Electronic structure and gate capacitance voltage characteristics of MBE silicon 'delta'-FETs. In: Materials modification and synthesis by ion beam processing. Pittsburgh: Materials Research Society; 1997. [citado 2026 fev. 10 ]Vancouver
Manzoli JE, Hipólito O. Electronic structure and gate capacitance voltage characteristics of MBE silicon 'delta'-FETs. In: Materials modification and synthesis by ion beam processing. Pittsburgh: Materials Research Society; 1997. [citado 2026 fev. 10 ]
