ReP USP - Resultado da busca

Trabalho de evento
Etching characteristics and surface morphology of nitrogen-doped a-SiC films prepared by RF magnetron sputtering (2008)
Fraga, Mariana Amorim; Pessoa, Rodrigo S; Oliveira, Ivo C; Massi, Marcos; Maciel, Homero Santiago; Martinho, Herculano Silva; Santos Filho, Sebastião Gomes dos ; Marcuzzo, Jossano Saldanha
Source: SBMICRO 2008: Anais. Conference titles: International Symposium on Microelectronics Technology and Devices SBMICRO. Unidade: EP
Assunto: MICROELETRÔNICA
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ABNT
FRAGA, Mariana Amorim et al. Etching characteristics and surface morphology of nitrogen-doped a-SiC films prepared by RF magnetron sputtering. 2008, Anais.. Pennington: The Electrochemical Society, 2008. Disponível em: https://doi.org/10.1149/1.2956052. Acesso em: 07 dez. 2025.
APA
Fraga, M. A., Pessoa, R. S., Oliveira, I. C., Massi, M., Maciel, H. S., Martinho, H. S., et al. (2008). Etching characteristics and surface morphology of nitrogen-doped a-SiC films prepared by RF magnetron sputtering. In SBMICRO 2008: Anais. Pennington: The Electrochemical Society. doi:10.1149/1.2956052
NLM
Fraga MA, Pessoa RS, Oliveira IC, Massi M, Maciel HS, Martinho HS, Santos Filho SG dos, Marcuzzo JS. Etching characteristics and surface morphology of nitrogen-doped a-SiC films prepared by RF magnetron sputtering [Internet]. SBMICRO 2008: Anais. 2008 ;[citado 2025 dez. 07 ] Available from: https://doi.org/10.1149/1.2956052
Vancouver
Fraga MA, Pessoa RS, Oliveira IC, Massi M, Maciel HS, Martinho HS, Santos Filho SG dos, Marcuzzo JS. Etching characteristics and surface morphology of nitrogen-doped a-SiC films prepared by RF magnetron sputtering [Internet]. SBMICRO 2008: Anais. 2008 ;[citado 2025 dez. 07 ] Available from: https://doi.org/10.1149/1.2956052
Artigo de periodico
Adhesion of reactive magnetron sputtered TINx and TICy coatings to AISI H13 tool steel (2007)
Recco, Abel André Cândido ; Oliveira, I C; Massi, Marcos; Maciel, Homero Santiago; Tschiptschin, André Paulo
Source: Surface & Coatings Technology. Unidade: EP
Subjects: TRATAMENTO DE SUPERFÍCIES, PLASMA, MATERIAIS (PROPRIEDADES MECÂNICAS)
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ABNT
RECCO, Abel André Cândido et al. Adhesion of reactive magnetron sputtered TINx and TICy coatings to AISI H13 tool steel. Surface & Coatings Technology, v. 202, n. 4-7, p. 1078-1083, 2007Tradução . . Disponível em: https://doi.org/10.1016/j.surfcoat.2007.07.073. Acesso em: 07 dez. 2025.
APA
Recco, A. A. C., Oliveira, I. C., Massi, M., Maciel, H. S., & Tschiptschin, A. P. (2007). Adhesion of reactive magnetron sputtered TINx and TICy coatings to AISI H13 tool steel. Surface & Coatings Technology, 202( 4-7), 1078-1083. doi:10.1016/j.surfcoat.2007.07.073
NLM
Recco AAC, Oliveira IC, Massi M, Maciel HS, Tschiptschin AP. Adhesion of reactive magnetron sputtered TINx and TICy coatings to AISI H13 tool steel [Internet]. Surface & Coatings Technology. 2007 ; 202( 4-7): 1078-1083.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1016/j.surfcoat.2007.07.073
Vancouver
Recco AAC, Oliveira IC, Massi M, Maciel HS, Tschiptschin AP. Adhesion of reactive magnetron sputtered TINx and TICy coatings to AISI H13 tool steel [Internet]. Surface & Coatings Technology. 2007 ; 202( 4-7): 1078-1083.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1016/j.surfcoat.2007.07.073
Trabalho de evento
Influência da razão entre a dureza e o módulo de elasticidade (H/E) na aderência de revestimentos de TiN e TiC depositados sobre aço AISI H13 (2006)
Recco, Abel André Cândido ; Tschiptschin, André Paulo ; Oliveira, I C; Massi, Marcos; Maciel, Homero Santiago
Source: Anais. CBECIMAT 2006. São Paulo, IPEN, 2006. Conference titles: Congresso Brasileiro de Engenharia e Ciência dos Materiais. Unidade: EP
Subjects: AÇO FERRAMENTA, ELASTICIDADE
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ABNT
RECCO, Abel André Cândido et al. Influência da razão entre a dureza e o módulo de elasticidade (H/E) na aderência de revestimentos de TiN e TiC depositados sobre aço AISI H13. 2006, Anais.. São Paulo: Instituto de Pesquisas Energéticas e Nucleares - IPEN, 2006. Disponível em: https://repositorio.usp.br/directbitstream/c64b5be7-4f80-45d3-9298-60600dc051a8/Tschiptschin-2006-Influ%C3%AAnciadaraz%C3%A3oentre_a_dureza_OK.pdf. Acesso em: 07 dez. 2025.
APA
Recco, A. A. C., Tschiptschin, A. P., Oliveira, I. C., Massi, M., & Maciel, H. S. (2006). Influência da razão entre a dureza e o módulo de elasticidade (H/E) na aderência de revestimentos de TiN e TiC depositados sobre aço AISI H13. In Anais. CBECIMAT 2006. São Paulo, IPEN, 2006. São Paulo: Instituto de Pesquisas Energéticas e Nucleares - IPEN. Recuperado de https://repositorio.usp.br/directbitstream/c64b5be7-4f80-45d3-9298-60600dc051a8/Tschiptschin-2006-Influ%C3%AAnciadaraz%C3%A3oentre_a_dureza_OK.pdf
NLM
Recco AAC, Tschiptschin AP, Oliveira IC, Massi M, Maciel HS. Influência da razão entre a dureza e o módulo de elasticidade (H/E) na aderência de revestimentos de TiN e TiC depositados sobre aço AISI H13 [Internet]. Anais. CBECIMAT 2006. São Paulo, IPEN, 2006. 2006 ;[citado 2025 dez. 07 ] Available from: https://repositorio.usp.br/directbitstream/c64b5be7-4f80-45d3-9298-60600dc051a8/Tschiptschin-2006-Influ%C3%AAnciadaraz%C3%A3oentre_a_dureza_OK.pdf
Vancouver
Recco AAC, Tschiptschin AP, Oliveira IC, Massi M, Maciel HS. Influência da razão entre a dureza e o módulo de elasticidade (H/E) na aderência de revestimentos de TiN e TiC depositados sobre aço AISI H13 [Internet]. Anais. CBECIMAT 2006. São Paulo, IPEN, 2006. 2006 ;[citado 2025 dez. 07 ] Available from: https://repositorio.usp.br/directbitstream/c64b5be7-4f80-45d3-9298-60600dc051a8/Tschiptschin-2006-Influ%C3%AAnciadaraz%C3%A3oentre_a_dureza_OK.pdf
Trabalho de evento-resumo
Characterization of tin and tic films deposited by magnetron sputtering using nanoindentation and atomic force microscopy (2006)
Recco, Abel André Cândido ; Kunioshi, Clarice Terui; Moré Farías, María Cristina ; Oliveira, I. C.; Maciel, Homero Santiago; Souza, Roberto Martins de ; Tschiptschin, André Paulo
Source: Final Program. Conference titles: Encontro da Sociedade Brasileira de Pesquisas em Materiais (SBPMat. Unidade: EP
Subjects: FILMES FINOS, RESISTÊNCIA DOS MATERIAIS, PROPRIEDADES DOS MATERIAIS
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ABNT
RECCO, Abel André Cândido et al. Characterization of tin and tic films deposited by magnetron sputtering using nanoindentation and atomic force microscopy. 2006, Anais.. Rio de Janeiro: SBPMat, 2006. Disponível em: https://repositorio.usp.br/directbitstream/df438757-77b2-458b-a0f7-0382b3952f0e/Souza_RM-2006-characterization%20of%20tin%20and%20tic%20films.pdf. Acesso em: 07 dez. 2025.
APA
Recco, A. A. C., Kunioshi, C. T., Moré Farías, M. C., Oliveira, I. C., Maciel, H. S., Souza, R. M. de, & Tschiptschin, A. P. (2006). Characterization of tin and tic films deposited by magnetron sputtering using nanoindentation and atomic force microscopy. In Final Program. Rio de Janeiro: SBPMat. Recuperado de https://repositorio.usp.br/directbitstream/df438757-77b2-458b-a0f7-0382b3952f0e/Souza_RM-2006-characterization%20of%20tin%20and%20tic%20films.pdf
NLM
Recco AAC, Kunioshi CT, Moré Farías MC, Oliveira IC, Maciel HS, Souza RM de, Tschiptschin AP. Characterization of tin and tic films deposited by magnetron sputtering using nanoindentation and atomic force microscopy [Internet]. Final Program. 2006 ;[citado 2025 dez. 07 ] Available from: https://repositorio.usp.br/directbitstream/df438757-77b2-458b-a0f7-0382b3952f0e/Souza_RM-2006-characterization%20of%20tin%20and%20tic%20films.pdf
Vancouver
Recco AAC, Kunioshi CT, Moré Farías MC, Oliveira IC, Maciel HS, Souza RM de, Tschiptschin AP. Characterization of tin and tic films deposited by magnetron sputtering using nanoindentation and atomic force microscopy [Internet]. Final Program. 2006 ;[citado 2025 dez. 07 ] Available from: https://repositorio.usp.br/directbitstream/df438757-77b2-458b-a0f7-0382b3952f0e/Souza_RM-2006-characterization%20of%20tin%20and%20tic%20films.pdf
Trabalho de evento
Characterization of mode transitions for RF discharges in different gases (2005)
Rodrigues, Bruno da Silva; Verdonck, Patrick Bernard; Maciel, Homero Santiago; Mansano, Ronaldo Domingues
Source: Proceedings v. 2005-08. Microelectronics Technology and Devices SBMICRO 2005. Conference titles: International Symposium on Microelectronics Technology and Devices SBMICRO. Unidade: EP
Assunto: MICROELETRÔNICA
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ABNT
RODRIGUES, Bruno da Silva et al. Characterization of mode transitions for RF discharges in different gases. 2005, Anais.. Pennington: The Electrochemical Society, 2005. . Acesso em: 07 dez. 2025.
APA
Rodrigues, B. da S., Verdonck, P. B., Maciel, H. S., & Mansano, R. D. (2005). Characterization of mode transitions for RF discharges in different gases. In Proceedings v. 2005-08. Microelectronics Technology and Devices SBMICRO 2005. Pennington: The Electrochemical Society.
NLM
Rodrigues B da S, Verdonck PB, Maciel HS, Mansano RD. Characterization of mode transitions for RF discharges in different gases. Proceedings v. 2005-08. Microelectronics Technology and Devices SBMICRO 2005. 2005 ;[citado 2025 dez. 07 ]
Vancouver
Rodrigues B da S, Verdonck PB, Maciel HS, Mansano RD. Characterization of mode transitions for RF discharges in different gases. Proceedings v. 2005-08. Microelectronics Technology and Devices SBMICRO 2005. 2005 ;[citado 2025 dez. 07 ]
Artigo de periodico
The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films (2004)
Guerino, M.; Massi, Marcos; Maciel, Homero Santiago; Otani, C.; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Libardi, J.
Source: Diamond and Related Materials,. Unidade: EP
Assunto: FILMES FINOS
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ABNT
GUERINO, M. et al. The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films. Diamond and Related Materials, v. 13, n. 2, p. 316-319, 2004Tradução . . Disponível em: https://doi.org/10.1016/j.diamond.2003.10.016. Acesso em: 07 dez. 2025.
APA
Guerino, M., Massi, M., Maciel, H. S., Otani, C., Mansano, R. D., Verdonck, P. B., & Libardi, J. (2004). The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films. Diamond and Related Materials,, 13( 2), 316-319. doi:10.1016/j.diamond.2003.10.016
NLM
Guerino M, Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB, Libardi J. The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films [Internet]. Diamond and Related Materials,. 2004 ; 13( 2): 316-319.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1016/j.diamond.2003.10.016
Vancouver
Guerino M, Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB, Libardi J. The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films [Internet]. Diamond and Related Materials,. 2004 ; 13( 2): 316-319.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1016/j.diamond.2003.10.016
Trabalho de evento
Study of of the influence of the secondary electron emission coefficient in radio-frequency argonplasmas using particle in cell simulation (2003)
Cizzoto, Elias Rodrigues; Roberto, Marisa; Verdonck, Patrick Bernard; Maciel, Homero Santiago
Source: Proceedings.. Conference titles: International Symposium on Microelectronics Technology and Devices - SBMICRO. Unidade: EP
Assunto: PLASMA (MICROELETRÔNICA)
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ABNT
CIZZOTO, Elias Rodrigues et al. Study of of the influence of the secondary electron emission coefficient in radio-frequency argonplasmas using particle in cell simulation. 2003, Anais.. Pennington: The Electrochemical Society, 2003. . Acesso em: 07 dez. 2025.
APA
Cizzoto, E. R., Roberto, M., Verdonck, P. B., & Maciel, H. S. (2003). Study of of the influence of the secondary electron emission coefficient in radio-frequency argonplasmas using particle in cell simulation. In Proceedings.. Pennington: The Electrochemical Society.
NLM
Cizzoto ER, Roberto M, Verdonck PB, Maciel HS. Study of of the influence of the secondary electron emission coefficient in radio-frequency argonplasmas using particle in cell simulation. Proceedings. 2003 ;[citado 2025 dez. 07 ]
Vancouver
Cizzoto ER, Roberto M, Verdonck PB, Maciel HS. Study of of the influence of the secondary electron emission coefficient in radio-frequency argonplasmas using particle in cell simulation. Proceedings. 2003 ;[citado 2025 dez. 07 ]
Artigo de periodico
Plasma etching of DLC films for microfluidic channels (2003)
Massi, Marcos; Jaramillo Ocampo, Juan Manuel; Maciel, Homero Santiago; Grigorov, K.; Otani, C.; Santos, L. V.; Mansano, Ronaldo Domingues
Source: Microelectronics Journal,. Unidade: EP
Assunto: PLASMA (MICROELETRÔNICA)
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ABNT
MASSI, Marcos et al. Plasma etching of DLC films for microfluidic channels. Microelectronics Journal, v. 34, n. 5-8, p. 635-638, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0026-2692(03)00077-6. Acesso em: 07 dez. 2025.
APA
Massi, M., Jaramillo Ocampo, J. M., Maciel, H. S., Grigorov, K., Otani, C., Santos, L. V., & Mansano, R. D. (2003). Plasma etching of DLC films for microfluidic channels. Microelectronics Journal,, 34( 5-8), 635-638. doi:10.1016/s0026-2692(03)00077-6
NLM
Massi M, Jaramillo Ocampo JM, Maciel HS, Grigorov K, Otani C, Santos LV, Mansano RD. Plasma etching of DLC films for microfluidic channels [Internet]. Microelectronics Journal,. 2003 ; 34( 5-8): 635-638.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1016/s0026-2692(03)00077-6
Vancouver
Massi M, Jaramillo Ocampo JM, Maciel HS, Grigorov K, Otani C, Santos LV, Mansano RD. Plasma etching of DLC films for microfluidic channels [Internet]. Microelectronics Journal,. 2003 ; 34( 5-8): 635-638.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1016/s0026-2692(03)00077-6
Artigo de periodico
The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films (2003)
Guerino, M.; Massi, Marcos; Maciel, Homero Santiago; Otani, C.; Mansano, Ronaldo Domingues
Source: Microelectronics Journal. Unidade: EP
Assunto: PLASMA (MICROELETRÔNICA)
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ABNT
GUERINO, M. et al. The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films. Microelectronics Journal, v. 34, n. 5-8, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0026-2692(03)00079-x. Acesso em: 07 dez. 2025.
APA
Guerino, M., Massi, M., Maciel, H. S., Otani, C., & Mansano, R. D. (2003). The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films. Microelectronics Journal, 34( 5-8). doi:10.1016/s0026-2692(03)00079-x
NLM
Guerino M, Massi M, Maciel HS, Otani C, Mansano RD. The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films [Internet]. Microelectronics Journal. 2003 ; 34( 5-8):[citado 2025 dez. 07 ] Available from: https://doi.org/10.1016/s0026-2692(03)00079-x
Vancouver
Guerino M, Massi M, Maciel HS, Otani C, Mansano RD. The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films [Internet]. Microelectronics Journal. 2003 ; 34( 5-8):[citado 2025 dez. 07 ] Available from: https://doi.org/10.1016/s0026-2692(03)00079-x
Artigo de periodico
Electrical and structural characterization of DLC films deposited by magnetron sputtering (2001)
Massi, Marcos; Maciel, Homero Santiago; Otani, C.; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard
Source: Journal of Materials Science: Materials in Electronics. Unidade: EP
Assunto: FILMES FINOS
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ABNT
MASSI, Marcos et al. Electrical and structural characterization of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics, v. 12, p. 343-346, 2001Tradução . . Acesso em: 07 dez. 2025.
APA
Massi, M., Maciel, H. S., Otani, C., Mansano, R. D., & Verdonck, P. B. (2001). Electrical and structural characterization of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics, 12, 343-346.
NLM
Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB. Electrical and structural characterization of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics. 2001 ; 12 343-346.[citado 2025 dez. 07 ]
Vancouver
Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB. Electrical and structural characterization of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics. 2001 ; 12 343-346.[citado 2025 dez. 07 ]
Artigo de periodico
Electrical and structural characterisation of DLC films deposited by magnetron sputtering (2001)
Massi, Marcos; Maciel, Homero Santiago; Otani, C.; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard
Source: Journal of Materials Science: Materials in Electronics. Conference titles: International Conference on Materials for Microelectronics. Unidade: EP
Assunto: FILMES
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ABNT
MASSI, Marcos et al. Electrical and structural characterisation of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics, v. 12, p. 343–346, 2001Tradução . . Disponível em: https://doi.org/10.1023/A:1011252629646. Acesso em: 07 dez. 2025.
APA
Massi, M., Maciel, H. S., Otani, C., Mansano, R. D., & Verdonck, P. B. (2001). Electrical and structural characterisation of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics, 12, 343–346. doi:10.1023/A:1011252629646
NLM
Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB. Electrical and structural characterisation of DLC films deposited by magnetron sputtering [Internet]. Journal of Materials Science: Materials in Electronics. 2001 ; 12 343–346.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1023/A:1011252629646
Vancouver
Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB. Electrical and structural characterisation of DLC films deposited by magnetron sputtering [Internet]. Journal of Materials Science: Materials in Electronics. 2001 ; 12 343–346.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1023/A:1011252629646
Artigo de periodico
Performance characterization of an RIE reactor with built-in RF excitation antenna (2000)
Massi, Marcos; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Maciel, Homero Santiago; Cirino, Giuseppe Antonio; Castro, Raul Murete de; Pisani, Marcelo B.
Source: Solid-State Devices and Circuits. Unidade: EP
Assunto: ANTENAS
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ABNT
MASSI, Marcos et al. Performance characterization of an RIE reactor with built-in RF excitation antenna. Solid-State Devices and Circuits, v. 8, n. 1, p. 1-4, 2000Tradução . . Acesso em: 07 dez. 2025.
APA
Massi, M., Mansano, R. D., Verdonck, P. B., Maciel, H. S., Cirino, G. A., Castro, R. M. de, & Pisani, M. B. (2000). Performance characterization of an RIE reactor with built-in RF excitation antenna. Solid-State Devices and Circuits, 8( 1), 1-4.
NLM
Massi M, Mansano RD, Verdonck PB, Maciel HS, Cirino GA, Castro RM de, Pisani MB. Performance characterization of an RIE reactor with built-in RF excitation antenna. Solid-State Devices and Circuits. 2000 ; 8( 1): 1-4.[citado 2025 dez. 07 ]
Vancouver
Massi M, Mansano RD, Verdonck PB, Maciel HS, Cirino GA, Castro RM de, Pisani MB. Performance characterization of an RIE reactor with built-in RF excitation antenna. Solid-State Devices and Circuits. 2000 ; 8( 1): 1-4.[citado 2025 dez. 07 ]
Artigo de periodico
End-point detection of polymer etching using Langmuir probes (2000)
Castro, Raul Murete de; Verdonck, Patrick Bernard; Pisani, Marcelo B.; Mansano, Ronaldo Domingues ; Cirino, Giuseppe Antonio; Maciel, Homero Santiago; Massi, Marcos
Source: IEEE Transactions on Plasma Science. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
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ABNT
CASTRO, Raul Murete de et al. End-point detection of polymer etching using Langmuir probes. IEEE Transactions on Plasma Science, v. 28, n. Ju 2000, p. 1043-1049, 2000Tradução . . Disponível em: https://doi.org/10.1109/27.887774. Acesso em: 07 dez. 2025.
APA
Castro, R. M. de, Verdonck, P. B., Pisani, M. B., Mansano, R. D., Cirino, G. A., Maciel, H. S., & Massi, M. (2000). End-point detection of polymer etching using Langmuir probes. IEEE Transactions on Plasma Science, 28( Ju 2000), 1043-1049. doi:10.1109/27.887774
NLM
Castro RM de, Verdonck PB, Pisani MB, Mansano RD, Cirino GA, Maciel HS, Massi M. End-point detection of polymer etching using Langmuir probes [Internet]. IEEE Transactions on Plasma Science. 2000 ; 28( Ju 2000): 1043-1049.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1109/27.887774
Vancouver
Castro RM de, Verdonck PB, Pisani MB, Mansano RD, Cirino GA, Maciel HS, Massi M. End-point detection of polymer etching using Langmuir probes [Internet]. IEEE Transactions on Plasma Science. 2000 ; 28( Ju 2000): 1043-1049.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1109/27.887774
Artigo de periodico
A comparative study of single and double langmuir probe techniques for RF plasma characterization (1999)
Castro, Raul Murete de; Cirino, Giuseppe Antonio; Verdonck, Patrick Bernard; Maciel, Homero Santiago; Massi, Marcos; Pisani, M B; Mansano, Ronaldo Domingues
Source: Contributions to plasma physics. Unidade: EP
Assunto: PLASMA (MICROELETRÔNICA)
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ABNT
CASTRO, Raul Murete de et al. A comparative study of single and double langmuir probe techniques for RF plasma characterization. Contributions to plasma physics, v. 39, n. 3, p. 235-246, 1999Tradução . . Acesso em: 07 dez. 2025.
APA
Castro, R. M. de, Cirino, G. A., Verdonck, P. B., Maciel, H. S., Massi, M., Pisani, M. B., & Mansano, R. D. (1999). A comparative study of single and double langmuir probe techniques for RF plasma characterization. Contributions to plasma physics, 39( 3), 235-246.
NLM
Castro RM de, Cirino GA, Verdonck PB, Maciel HS, Massi M, Pisani MB, Mansano RD. A comparative study of single and double langmuir probe techniques for RF plasma characterization. Contributions to plasma physics. 1999 ;39( 3): 235-246.[citado 2025 dez. 07 ]
Vancouver
Castro RM de, Cirino GA, Verdonck PB, Maciel HS, Massi M, Pisani MB, Mansano RD. A comparative study of single and double langmuir probe techniques for RF plasma characterization. Contributions to plasma physics. 1999 ;39( 3): 235-246.[citado 2025 dez. 07 ]
Trabalho de evento
The applicability of Langmuir probes for end point detection of polymer etching (1999)
Mansano, Ronaldo Domingues ; Nogueira, Paula Maria; Zambom, Luís da Silva ; Verdonck, Patrick Bernard; Massi, Marcos; Maciel, Homero Santiago
Source: ICMP 99: technical digest. Conference titles: International Conference on Microelectronics and Packaging. Unidade: EP
Assunto: FILMES
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ABNT
MANSANO, Ronaldo Domingues et al. The applicability of Langmuir probes for end point detection of polymer etching. 1999, Anais.. São Paulo: SBMicro/IMAPS, 1999. . Acesso em: 07 dez. 2025.
APA
Mansano, R. D., Nogueira, P. M., Zambom, L. da S., Verdonck, P. B., Massi, M., & Maciel, H. S. (1999). The applicability of Langmuir probes for end point detection of polymer etching. In ICMP 99: technical digest. São Paulo: SBMicro/IMAPS.
NLM
Mansano RD, Nogueira PM, Zambom L da S, Verdonck PB, Massi M, Maciel HS. The applicability of Langmuir probes for end point detection of polymer etching. ICMP 99: technical digest. 1999 ;[citado 2025 dez. 07 ]
Vancouver
Mansano RD, Nogueira PM, Zambom L da S, Verdonck PB, Massi M, Maciel HS. The applicability of Langmuir probes for end point detection of polymer etching. ICMP 99: technical digest. 1999 ;[citado 2025 dez. 07 ]
Artigo de periodico
Influence of plasma etching on Raman spectra of DLC films deposited by magnetron sputtering (1999)
Massi, Marcos; Mansano, Ronaldo Domingues ; Maciel, Homero Santiago; Otani, C.; Verdonck, Patrick Bernard; Nishioka, L. N. B. M.
Source: Boletim Técnico da Escola Politécnica da USP. Departamento de Engenharia Eletrônica. Unidade: EP
Assunto: ENGENHARIA ELÉTRICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
MASSI, Marcos et al. Influence of plasma etching on Raman spectra of DLC films deposited by magnetron sputtering. Boletim Técnico da Escola Politécnica da USP. Departamento de Engenharia Eletrônica, n. 41, 1999Tradução . . Disponível em: https://repositorio.usp.br/directbitstream/fa947f7e-177c-4df9-8496-d89415d67262/BT-PEE-99_41_250911_082721.pdf. Acesso em: 07 dez. 2025.
APA
Massi, M., Mansano, R. D., Maciel, H. S., Otani, C., Verdonck, P. B., & Nishioka, L. N. B. M. (1999). Influence of plasma etching on Raman spectra of DLC films deposited by magnetron sputtering. Boletim Técnico da Escola Politécnica da USP. Departamento de Engenharia Eletrônica, (41). Recuperado de https://repositorio.usp.br/directbitstream/fa947f7e-177c-4df9-8496-d89415d67262/BT-PEE-99_41_250911_082721.pdf
NLM
Massi M, Mansano RD, Maciel HS, Otani C, Verdonck PB, Nishioka LNBM. Influence of plasma etching on Raman spectra of DLC films deposited by magnetron sputtering [Internet]. Boletim Técnico da Escola Politécnica da USP. Departamento de Engenharia Eletrônica. 1999 ;(41):[citado 2025 dez. 07 ] Available from: https://repositorio.usp.br/directbitstream/fa947f7e-177c-4df9-8496-d89415d67262/BT-PEE-99_41_250911_082721.pdf
Vancouver
Massi M, Mansano RD, Maciel HS, Otani C, Verdonck PB, Nishioka LNBM. Influence of plasma etching on Raman spectra of DLC films deposited by magnetron sputtering [Internet]. Boletim Técnico da Escola Politécnica da USP. Departamento de Engenharia Eletrônica. 1999 ;(41):[citado 2025 dez. 07 ] Available from: https://repositorio.usp.br/directbitstream/fa947f7e-177c-4df9-8496-d89415d67262/BT-PEE-99_41_250911_082721.pdf
Trabalho de evento
Influence of methane addition on the characteristics of magnetron sputtered hydrogenated carbon films (1999)
Mansano, Ronaldo Domingues ; Nogueira, Paula Maria; Zambom, Luís da Silva ; Verdonck, Patrick Bernard; Massi, Marcos; Maciel, Homero Santiago
Source: ICMP 99: technical digest. Conference titles: International Conference on Microelectronics and Packaging. Unidade: EP
Assunto: FILMES
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
MANSANO, Ronaldo Domingues et al. Influence of methane addition on the characteristics of magnetron sputtered hydrogenated carbon films. 1999, Anais.. São Paulo: SBMicro/IMAPS, 1999. . Acesso em: 07 dez. 2025.
APA
Mansano, R. D., Nogueira, P. M., Zambom, L. da S., Verdonck, P. B., Massi, M., & Maciel, H. S. (1999). Influence of methane addition on the characteristics of magnetron sputtered hydrogenated carbon films. In ICMP 99: technical digest. São Paulo: SBMicro/IMAPS.
NLM
Mansano RD, Nogueira PM, Zambom L da S, Verdonck PB, Massi M, Maciel HS. Influence of methane addition on the characteristics of magnetron sputtered hydrogenated carbon films. ICMP 99: technical digest. 1999 ;[citado 2025 dez. 07 ]
Vancouver
Mansano RD, Nogueira PM, Zambom L da S, Verdonck PB, Massi M, Maciel HS. Influence of methane addition on the characteristics of magnetron sputtered hydrogenated carbon films. ICMP 99: technical digest. 1999 ;[citado 2025 dez. 07 ]
Artigo de periodico
Effects of plasma etching on DLC films (1999)
Massi, Marcos; Mansano, Ronaldo Domingues ; Maciel, Homero Santiago; Otani, C.; Verdonck, Patrick Bernard; Nishioka, L. N. B. M.
Source: Thin Solid Films. Unidade: EP
Assunto: PLASMA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
MASSI, Marcos et al. Effects of plasma etching on DLC films. Thin Solid Films, n. 343-344, p. 381-384, 1999Tradução . . Disponível em: https://doi.org/10.1016/s0040-6090(98)01691-5. Acesso em: 07 dez. 2025.
APA
Massi, M., Mansano, R. D., Maciel, H. S., Otani, C., Verdonck, P. B., & Nishioka, L. N. B. M. (1999). Effects of plasma etching on DLC films. Thin Solid Films, ( 343-344), 381-384. doi:10.1016/s0040-6090(98)01691-5
NLM
Massi M, Mansano RD, Maciel HS, Otani C, Verdonck PB, Nishioka LNBM. Effects of plasma etching on DLC films [Internet]. Thin Solid Films. 1999 ;( 343-344): 381-384.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1016/s0040-6090(98)01691-5
Vancouver
Massi M, Mansano RD, Maciel HS, Otani C, Verdonck PB, Nishioka LNBM. Effects of plasma etching on DLC films [Internet]. Thin Solid Films. 1999 ;( 343-344): 381-384.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1016/s0040-6090(98)01691-5
Artigo de periodico
Silicon surface roughness induced by SF6-based reactive ion etching processes for micromachining applications (1998)
Verdonck, Patrick Bernard; Mansano, Ronaldo Domingues ; Maciel, Homero Santiago; Salvadori, Maria Cecília Barbosa da Silveira
Source: Journal of Solid-State Devices and Circuits. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
VERDONCK, Patrick Bernard et al. Silicon surface roughness induced by SF6-based reactive ion etching processes for micromachining applications. Journal of Solid-State Devices and Circuits, v. 6, n. 1, p. 1-6, 1998Tradução . . Acesso em: 07 dez. 2025.
APA
Verdonck, P. B., Mansano, R. D., Maciel, H. S., & Salvadori, M. C. B. da S. (1998). Silicon surface roughness induced by SF6-based reactive ion etching processes for micromachining applications. Journal of Solid-State Devices and Circuits, 6( 1), 1-6.
NLM
Verdonck PB, Mansano RD, Maciel HS, Salvadori MCB da S. Silicon surface roughness induced by SF6-based reactive ion etching processes for micromachining applications. Journal of Solid-State Devices and Circuits. 1998 ; 6( 1): 1-6.[citado 2025 dez. 07 ]
Vancouver
Verdonck PB, Mansano RD, Maciel HS, Salvadori MCB da S. Silicon surface roughness induced by SF6-based reactive ion etching processes for micromachining applications. Journal of Solid-State Devices and Circuits. 1998 ; 6( 1): 1-6.[citado 2025 dez. 07 ]
Artigo de periodico
Deep trench etching in silicon with fluorine containing plasmas (1998)
Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Maciel, Homero Santiago
Source: Boletim Técnico da Escola Politécnica da USP. Departamento de Engenharia Eletrônica. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
MANSANO, Ronaldo Domingues e VERDONCK, Patrick Bernard e MACIEL, Homero Santiago. Deep trench etching in silicon with fluorine containing plasmas. Boletim Técnico da Escola Politécnica da USP. Departamento de Engenharia Eletrônica, n. 12, 1998Tradução . . Disponível em: https://repositorio.usp.br/directbitstream/32637ac9-acc6-40db-9b07-d2cee0f24d2f/BT-PEE-98_12_250925_151339.pdf. Acesso em: 07 dez. 2025.
APA
Mansano, R. D., Verdonck, P. B., & Maciel, H. S. (1998). Deep trench etching in silicon with fluorine containing plasmas. Boletim Técnico da Escola Politécnica da USP. Departamento de Engenharia Eletrônica, (12). Recuperado de https://repositorio.usp.br/directbitstream/32637ac9-acc6-40db-9b07-d2cee0f24d2f/BT-PEE-98_12_250925_151339.pdf
NLM
Mansano RD, Verdonck PB, Maciel HS. Deep trench etching in silicon with fluorine containing plasmas [Internet]. Boletim Técnico da Escola Politécnica da USP. Departamento de Engenharia Eletrônica. 1998 ;(12):[citado 2025 dez. 07 ] Available from: https://repositorio.usp.br/directbitstream/32637ac9-acc6-40db-9b07-d2cee0f24d2f/BT-PEE-98_12_250925_151339.pdf
Vancouver
Mansano RD, Verdonck PB, Maciel HS. Deep trench etching in silicon with fluorine containing plasmas [Internet]. Boletim Técnico da Escola Politécnica da USP. Departamento de Engenharia Eletrônica. 1998 ;(12):[citado 2025 dez. 07 ] Available from: https://repositorio.usp.br/directbitstream/32637ac9-acc6-40db-9b07-d2cee0f24d2f/BT-PEE-98_12_250925_151339.pdf

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