Development of spacer etching processes for 'GA''AS' ic technologies (1996)
Source: Proceedings. Conference titles: Conference of the Brazilian Microelectronics Society. Unidade: EP
Assunto: SEMICONDUTORES
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DIETRICH, Alvaro Batista e VERDONCK, Patrick Bernard e SWART, Jacobus Willibrordus. Development of spacer etching processes for 'GA''AS' ic technologies. 1996, Anais.. São Paulo: Sbmicro, 1996. . Acesso em: 02 nov. 2025.APA
Dietrich, A. B., Verdonck, P. B., & Swart, J. W. (1996). Development of spacer etching processes for 'GA''AS' ic technologies. In Proceedings. São Paulo: Sbmicro.NLM
Dietrich AB, Verdonck PB, Swart JW. Development of spacer etching processes for 'GA''AS' ic technologies. Proceedings. 1996 ;[citado 2025 nov. 02 ]Vancouver
Dietrich AB, Verdonck PB, Swart JW. Development of spacer etching processes for 'GA''AS' ic technologies. Proceedings. 1996 ;[citado 2025 nov. 02 ]
