Source: Japanese Journal of Applied Physics. Unidade: EP
Subjects: PLASMA, POLÍMEROS (MATERIAIS), VÁCUO, OXIDAÇÃO
ABNT
TAN, Ing Hwie et al. Aluminum implantation in Kapton for space applications magnetic field effects on implantation in vacuum arcs. Japanese Journal of Applied Physics, v. 44, n. 7A, p. 5211-5215, 2005Tradução . . Acesso em: 19 out. 2024.APA
Tan, I. H., Ueda, M., Dallaqua, R. S., Rossi, J. O., Beloto, A. F., Demarquette, N. R., & Gengembre, L. (2005). Aluminum implantation in Kapton for space applications magnetic field effects on implantation in vacuum arcs. Japanese Journal of Applied Physics, 44( 7A), 5211-5215.NLM
Tan IH, Ueda M, Dallaqua RS, Rossi JO, Beloto AF, Demarquette NR, Gengembre L. Aluminum implantation in Kapton for space applications magnetic field effects on implantation in vacuum arcs. Japanese Journal of Applied Physics. 2005 ;44( 7A): 5211-5215.[citado 2024 out. 19 ]Vancouver
Tan IH, Ueda M, Dallaqua RS, Rossi JO, Beloto AF, Demarquette NR, Gengembre L. Aluminum implantation in Kapton for space applications magnetic field effects on implantation in vacuum arcs. Japanese Journal of Applied Physics. 2005 ;44( 7A): 5211-5215.[citado 2024 out. 19 ]