Filtros : "Yu, K M" Limpar

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  • Source: Journal of Applied Physics. Unidade: IF

    Assunto: ÍONS

    DOIHow to cite
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    • ABNT

      SALVADORI, M C; BROWN, I G; YU, K M; et al. On the electrical conductivity of 'TI'-implanted alumina. Journal of Applied Physics, Menasha, v. 111, n. 6, p. 063714, 2012. DOI: 10.1063/1.3697900.
    • APA

      Salvadori, M. C., Brown, I. G., Yu, K. M., Phillips, L., Park, H. K., Oks, E. M., et al. (2012). On the electrical conductivity of 'TI'-implanted alumina. Journal of Applied Physics, 111( 6), 063714. doi:10.1063/1.3697900
    • NLM

      Salvadori MC, Brown IG, Yu KM, Phillips L, Park HK, Oks EM, Savkin KP, Nikolaev A, Teixeira FS, Cattani M. On the electrical conductivity of 'TI'-implanted alumina. Journal of Applied Physics. 2012 ;111( 6): 063714.
    • Vancouver

      Salvadori MC, Brown IG, Yu KM, Phillips L, Park HK, Oks EM, Savkin KP, Nikolaev A, Teixeira FS, Cattani M. On the electrical conductivity of 'TI'-implanted alumina. Journal of Applied Physics. 2012 ;111( 6): 063714.
  • Source: Applied Physics Letters. Unidade: IF

    Assunto: FILMES FINOS

    Acesso à fonteDOIHow to cite
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    • ABNT

      SALVADORI, M C; TEIXEIRA, F S; SGUBIN, L G; et al. Low cost ion implantation technique. Applied Physics Letters, Melville, v. 101, n. 22, p. 224104/1-224104/4, 2012. Disponível em: < http://apl.aip.org/resource/1/applab/v101/i22/p224104_s1 > DOI: 10.1063/1.4768699.
    • APA

      Salvadori, M. C., Teixeira, F. S., Sgubin, L. G., Araujo, W. W. R., Spirin, R. E., Oks, E. M., et al. (2012). Low cost ion implantation technique. Applied Physics Letters, 101( 22), 224104/1-224104/4. doi:10.1063/1.4768699
    • NLM

      Salvadori MC, Teixeira FS, Sgubin LG, Araujo WWR, Spirin RE, Oks EM, Yu KM, Brown IG. Low cost ion implantation technique [Internet]. Applied Physics Letters. 2012 ;101( 22): 224104/1-224104/4.Available from: http://apl.aip.org/resource/1/applab/v101/i22/p224104_s1
    • Vancouver

      Salvadori MC, Teixeira FS, Sgubin LG, Araujo WWR, Spirin RE, Oks EM, Yu KM, Brown IG. Low cost ion implantation technique [Internet]. Applied Physics Letters. 2012 ;101( 22): 224104/1-224104/4.Available from: http://apl.aip.org/resource/1/applab/v101/i22/p224104_s1
  • Source: Surface and Coatings Technology. Unidade: IF

    Assunto: MATÉRIA CONDENSADA

    Acesso à fonteDOIHow to cite
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    • ABNT

      SALVADORI, Maria Cecilia Barbosa da Silveira; CATTANI, Mauro Sergio Dorsa; VIZIR, A; et al. Metal ion mixing in diamond. Surface and Coatings Technology, Lausanne, v. 128-129, p. 375-380, 2000. Disponível em: < http://e5500.fapesp.br/cgi-bin/sciserv.pl?collection=journals&journal=02578972&issue=v128-129inone&article=375_mimid&form=pdf&file=file.pdf > DOI: 10.1016/s0257-8972(00)00607-1.
    • APA

      Salvadori, M. C. B. da S., Cattani, M. S. D., Vizir, A., Monteiro, O. R., Yu, K. M., & Brown, I. G. (2000). Metal ion mixing in diamond. Surface and Coatings Technology, 128-129, 375-380. doi:10.1016/s0257-8972(00)00607-1
    • NLM

      Salvadori MCB da S, Cattani MSD, Vizir A, Monteiro OR, Yu KM, Brown IG. Metal ion mixing in diamond [Internet]. Surface and Coatings Technology. 2000 ; 128-129 375-380.Available from: http://e5500.fapesp.br/cgi-bin/sciserv.pl?collection=journals&journal=02578972&issue=v128-129inone&article=375_mimid&form=pdf&file=file.pdf
    • Vancouver

      Salvadori MCB da S, Cattani MSD, Vizir A, Monteiro OR, Yu KM, Brown IG. Metal ion mixing in diamond [Internet]. Surface and Coatings Technology. 2000 ; 128-129 375-380.Available from: http://e5500.fapesp.br/cgi-bin/sciserv.pl?collection=journals&journal=02578972&issue=v128-129inone&article=375_mimid&form=pdf&file=file.pdf

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