The influence of the AC component of the plasma potential on the measurement of the ion flux (2004)
Source: Microelectronics Technology and Devices SBMicro 2004. Proceedings, v. 2004-03. Conference titles: International Symposium on Microelectronics Technology and Devices SBMICRO. Unidade: EP
Subjects: MICROELETRÔNICA, CIRCUITOS INTEGRADOS
ABNT
SWART, Jacobus Willibrordus e VERDONCK, Patrick Bernard. The influence of the AC component of the plasma potential on the measurement of the ion flux. 2004, Anais.. Pennington: The Electrochemical Society, 2004. . Acesso em: 28 mar. 2024.APA
Swart, J. W., & Verdonck, P. B. (2004). The influence of the AC component of the plasma potential on the measurement of the ion flux. In Microelectronics Technology and Devices SBMicro 2004. Proceedings, v. 2004-03. Pennington: The Electrochemical Society.NLM
Swart JW, Verdonck PB. The influence of the AC component of the plasma potential on the measurement of the ion flux. Microelectronics Technology and Devices SBMicro 2004. Proceedings, v. 2004-03. 2004 ;[citado 2024 mar. 28 ]Vancouver
Swart JW, Verdonck PB. The influence of the AC component of the plasma potential on the measurement of the ion flux. Microelectronics Technology and Devices SBMicro 2004. Proceedings, v. 2004-03. 2004 ;[citado 2024 mar. 28 ]