Source: Japanese Journal of Applied Physics. Unidade: EP
Subjects: PLASMA, POLÍMEROS (MATERIAIS), VÁCUO, OXIDAÇÃO
ABNT
TAN, Ing Hwie; UEDA, Mário; DALLAQUA, Renato Sergio; et al. Aluminum implantation in Kapton for space applications magnetic field effects on implantation in vacuum arcs. Japanese Journal of Applied Physics, Tokyo,JP, The Japan Society of Applied Physics, v. 44, n. 7A, p. 5211-5215, 2005.APA
Tan, I. H., Ueda, M., Dallaqua, R. S., Rossi, J. O., Beloto, A. F., Demarquette, N. R., & Gengembre, L. (2005). Aluminum implantation in Kapton for space applications magnetic field effects on implantation in vacuum arcs. Japanese Journal of Applied Physics, 44( 7A), 5211-5215.NLM
Tan IH, Ueda M, Dallaqua RS, Rossi JO, Beloto AF, Demarquette NR, Gengembre L. Aluminum implantation in Kapton for space applications magnetic field effects on implantation in vacuum arcs. Japanese Journal of Applied Physics. 2005 ;44( 7A): 5211-5215.Vancouver
Tan IH, Ueda M, Dallaqua RS, Rossi JO, Beloto AF, Demarquette NR, Gengembre L. Aluminum implantation in Kapton for space applications magnetic field effects on implantation in vacuum arcs. Japanese Journal of Applied Physics. 2005 ;44( 7A): 5211-5215.